The high deposition of microcrystalline silicon thin film by very high frequency plasma enhanced chemical vapour deposition and the fabrication of solar cells

著录项

• 来源
  《中国物理：英文版》 |2008年第9期|3464-3470|共7页
• 作者

  Chen Yong-Sheng; Gao Zhe; Wang Jian-Hua; Lu Jing-Xiao; Zheng Wen; Gu Jin-Hua; Yang Shi-E; Gao Xiao-Yong; Guo Xue-Jun; Zhao Shang-Li;

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• 作者单位

  Institute of Plasma Physics Chinese Academy of Sciences Hefei 230031 China;

  Key Laboratory of Material Physics Department of Physics Zhengzhou University Zhcngzhou 450052 China;

  Department of Materials Science and Engineering Wuhan Institute of Technology Wuhan 430073 China;

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• 原文格式 PDF
• 正文语种 chi
• 中图分类 物理学;
• 关键词

  chemical vapour deposition; plasma deposition; solar cells; crystallinity;

  机译：化学气相沉积;等离子体沉积太阳能电池;结晶度;