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Electronic synapses based on ultrathin quasi-two-dimensional gallium oxide memristor

机译:基于超薄准二维氧化镓忆阻器的电子突触

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摘要

Synapse emulation is very important for realizing neuromorphic computing, which could overcome the energy and throughput limitations of today's computing architectures. Memristors have been extensively studied for using in non-volatile memory storage and neuromorphic computing. In this paper, we report the fabrication of vertical sandwiched memristor device using ultrathin quasi-two-dimensional gallium oxide produced by squeegee method. The as-fabricated two-terminal memristor device exhibited the essential functions of biological synapses, such as depression and potentia-tion of synaptic weight, transition from short time memory to long time memory, spike-timing-dependent plasticity, and spike-rate-dependent plasticity. The synaptic weight of the memristor could be tuned by the applied voltage pulse, number, width, and frequency. We believe that the injection of the top Ag cations should play a significant role for the memristor phenomenon. The ultrathin of medium layer represents an advance to integration in vertical direction for future applications and our results provide an alternative way to fabricate synaptic devices.
机译:突触仿真对于实现神经形态计算非常重要,它可以克服当今计算架构的能量和吞吐量限制。忆阻器已被广泛研究用于非易失性存储器存储和神经形态计算中。在本文中,我们报道了使用刮刀法生产的超薄准二维氧化镓制造垂直夹层忆阻器的方法。制成的两端忆阻器器件具有生物学突触的基本功能,例如抑制和增强突触重量,从短时记忆过渡到长时记忆,依赖于尖峰时序的可塑性和尖峰速率。依赖可塑性。忆阻器的突触重量可以通过施加的电压脉冲,数量,宽度和频率来调整。我们认为,注入最上面的Ag阳离子应该对忆阻器现象起重要作用。中等厚度的超薄层代表了在垂直方向上集成的进步,可用于未来的应用,我们的结果为制造突触设备提供了另一种方法。

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  • 来源
    《中国物理:英文版》 |2019年第1期|192-198|共7页
  • 作者单位

    CAS Key Laboratory of Nanoscale Physics and Devices;

    Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences, Beijing 100190, China;

    School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100190, China;

    CAS Key Laboratory of Nanoscale Physics and Devices;

    Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences, Beijing 100190, China;

    Institute of Advanced Materials, Beijing Normal University, Beijing 100875, China;

    CAS Key Laboratory of Nanoscale Physics and Devices;

    Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences, Beijing 100190, China;

    School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100190, China;

    CAS Key Laboratory of Nanoscale Physics and Devices;

    Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences, Beijing 100190, China;

    Beijing Key Laboratory for Nanomaterials and Nanodevices, Beijing 100190, China;

    CAS Key Laboratory of Nanoscale Physics and Devices;

    Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences, Beijing 100190, China;

    School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100190, China;

    Beijing Key Laboratory for Nanomaterials and Nanodevices, Beijing 100190, China;

    CAS Key Laboratory of Nanoscale Physics and Devices;

    Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences, Beijing 100190, China;

    School of Physical Sciences, University of Chinese Academy of Sciences, Beijing 100190, China;

    Beijing Key Laboratory for Nanomaterials and Nanodevices, Beijing 100190, China;

    Songshan Lake Materials Laboratory, Dongguan 523808, China;

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