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Enhanced performance of AlGaN-based ultraviolet light-emitting diodes with linearly graded AlGaN inserting layer in electron blocking layer

机译:电子阻挡层中具有线性渐变AlGaN插入层的AlGaN基紫外发光二极管的增强性能

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摘要

The conventional stationary Al content AlGaN electron blocking layer (EBL) in ultraviolet light-emitting diode (UV LED) is optimized by employing a linearly graded AlGaN inserting layer which is 2.0 nm Al0.3Ga0.7N/5.0 nm AlxGa1?xN/8.0 nm Al0.3Ga0.7N with decreasing value of x. The results indicate that the internal quantum efficiency is significantly improved and the efficiency droop is mitigated by using the proposed structure. These improvements are at-tributed to the increase of the effective barrier height for electrons and the reduction of the effective barrier height for holes, which result in an increased hole injection efficiency and a decreased electron leakage into the p-type region. In addition, the linearly graded AlGaN inserting layer can generate more holes in EBL due to the polarization-induced hole doping and a tunneling effect probably occurs to enhance the hole transportation to the active regions, which will be beneficial to the radiative recombination.
机译:紫外发光二极管(UV LED)中常规的固定Al含量AlGaN电子阻挡层(EBL)通过使用线性渐变AlGaN插入层进行优化,该插入层为2.0 nm Al0.3Ga0.7N / 5.0 nm AlxGa1?xN / 8.0 nm x值减小的Al0.3Ga0.7N。结果表明,通过使用所提出的结构,内部量子效率显着提高,效率下降得以缓解。这些改善归因于电子的有效势垒高度的增加和空穴的有效势垒高度的减小,这导致空穴注入效率的提高和电子向p型区域的泄漏的减少。此外,由于极化引起的空穴掺杂,线性渐变的AlGaN插入层可在EBL中产生更多的空穴,并且可能会出现隧穿效应以增强空穴向有源区的传输,这将有利于辐射复合。

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  • 来源
    《中国物理:英文版》 |2019年第5期|420-425|共6页
  • 作者单位

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Engineering Research Center of Optoelectronic Functional Materials and Devices,Institute of Opto-Electronic Materials and Technology, South China Normal University, Guangzhou 510631, China;

    Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences, Guangzhou 510650, China;

    Guangdong Institute of Semiconductor Industrial Technology, Guangdong Academy of Sciences, Guangzhou 510650, China;

    School of Intelligent Manufacture and Equipment, Shenzhen Institute of Information Technology, Shenzhen 518172, China;

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