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Twin-layer films of copper phthalocyanine and amorphous titanyl or vanadyl phthalocyanine--an x-ray photoelectron spectroscopic study

机译:铜酞菁和无定形钛氧基或钒基酞菁的双层薄膜-X射线光电子能谱研究

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摘要

Metallophthalocyanine (MPc) twin-layer thin films on glass substrates, consisting of copper phthalocyanine (CuPc)overlayer and amorphous vanatyl phthalocyanine (VOPc) as well as titanyl phthalocyanine (TiOPc) buffers, were found to have different gas sensing characteristics. These twin-layer thin films were studied using x-ray photoemission spectroscopy. Photoelectrons of either Ti core levels were found to be present at the surface, indicating the existence of possible molecular migrations.The stability of the twin-layers under thermal annealing up to a maximum temperature of 250℃ and low-energy Aridprn bombardment was also examined and compared with that of CuPc directly grown on the substrates. We concluded that the twin-layer structures were thermally fairly stable. Ar ion bombardment,however, caused substantial damage to the Pc ligands and a reduction of the valence state of the central Cu atoms.
机译:发现在玻璃基板上的金属酞菁(MPc)双层薄膜由铜酞菁(CuPc)覆盖层和无定形钒基酞菁(VOPc)以及钛氧基酞菁(TiOPc)缓冲液组成,具有不同的气敏特性。使用X射线光发射光谱法研究了这些双层膜。在表面发现存在任何Ti核能级的光电子,表明存在可能的分子迁移。还研究了在高达250℃的最高温度和低能量的Aridprn轰击下的热退火过程中双分子层的稳定性。与直接生长在基板上的CuPc进行比较。我们得出的结论是,双层结构在热方面相当稳定。但是,Ar离子轰击对Pc配体造成了实质性损害,并降低了中心Cu原子的价态。

著录项

  • 来源
    《中国物理:英文版》 |2002年第4期|393-398|共6页
  • 作者单位

    State Key Laboratory for Surface Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China;

    Joule Physics Laboratory, Institute for Materials Research, University of Salford, Maxwell Building, Salford, Greater Manchester M5 4WT, UK;

    Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8001, Japan;

    Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8001, Japan;

  • 收录信息 中国科学引文数据库(CSCD);
  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 物理学;
  • 关键词

    phthalocyanine; x-ray photoemission spectra; annealing; Ar+ bombardment;

    机译:酞菁;x射线发射光谱;退火;Ar +轰击;
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