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Deposition of carbon nitride films for space application

机译:用于空间应用的氮化碳膜的沉积

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摘要

Carbon nitride thin films were prepared by electron-beam evaporation assisted with nitrogen ion bombardment and TiN/CNx composite films were by unbalanced dc magnetron sputtering, respectively. It was found that the sputtered films were better than the evaporated films in hardness and adhesion. The experiments of atomic oxygen action, cold welding, friction and wearing were emphasized, and the results proved that the sputtered TiN/CNx composite films were suitable for space application.
机译:氮离子轰击辅助电子束蒸发制备氮化碳薄膜,不平衡直流磁控溅射分别制备TiN / CNx复合膜。发现溅射膜在硬度和粘附性方面优于蒸发膜。重点研究了原子氧作用,冷焊,摩擦和磨损实验,结果表明溅射TiN / CNx复合膜适合于空间应用。

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