机译:衬底温度对掺硼微晶硅膜生长和性能的影响
Institute of Micro and Nano Science and Technology,Shanghai Jiaotong University,Shanghai 200030,China;
Institute of Micro and Nano Science and Technology,Shanghai Jiaotong University,Shanghai 200030,China;
Institute of Photo-Electronics,Nankai University,Tianjin 300071,China;
Institute of Photo-Electronics,Nankai University,Tianjin 300071,China;
Institute of Photo-Electronics,Nankai University,Tianjin 300071,China;
Institute of Micro and Nano Science and Technology,Shanghai Jiaotong University,Shanghai 200030,China;
boron-doped μc-Si:H films; VHF PECVD; crystallinity; carrier concentration; Hall mobility;