RF electric field penetration and power deposition into nonequilibrium planar-type inductively coupled plasmas

摘要

The RF electric field penetration and the power deposition into planar-type inductively coupled plasmas in lowpressure discharges have been studied by means of a self-consistent model which consists of Maxwell equations combined with the kinetic equation of electrons. The Maxwell equations are solved based on the expansion of the Fourier-Bessel series for determining the RF electric field. Numerical results show the influence of a non-Maxwellian electron energy distribution on the RF electric field penetration and the power deposition for different coil currents. Moreover, the two-dimensional spatial profiles of RF electric field and power density are also shown for different numbers of RF coil turns.