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Tunable Ba0.5Sr0.5TiO3 film bulk acoustic resonators using SiO2/Mo Bragg reflectors

机译:使用SiO2 / Mo布拉格反射器的可调谐Ba0.5Sr0.5TiO3薄膜体声谐振器

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摘要

Tunable and switchable Ba0.5Sr0.5TiO3 film bulk acoustic resonators (FBARs) based on SiO2/Mo Bragg reflectors are explored,which can withstand high temperature for the deposition of BaxSr1-xTiO3 (BST) films at 800 ℃.The dc bias-dependent resonance may be attributed to the piezoelectricity of the BST film induced by an electrostrictive effect.The series resonant frequency is strongly dc bias-dependent and shifts downwards with dc bias increasing,while the parallel resonant frequency is only weakly dc bias-dependent and slightly shifts upwards at low dc bias (< 45 V) while downwards at higher dc bias.The calculated relative tunability of shifts at series resonance frcquency is around -2.3% and the electromechanical coupling coefficient is up to approximately 8.09% at 60-V dc bias,which can be comparable to A1N FBARs.This suggests that a high-quality tunable BST FBAR device can be achieved through the use of molybdenum (Mo) as the high acoustic impedance layer in a Bragg reflector,which not only provides excellent acoustic isolation from the substrate,but also improves the crystallinity of BST films withstanding higher deposition temperature.
机译:研究了基于SiO2 / Mo Bragg反射器的可调谐和可切换的Ba0.5Sr0.5TiO3薄膜体声波谐振器(FBAR),其在800℃下能承受高温沉积BaxSr1-xTiO3(BST)薄膜。直流偏置相关谐振可能归因于电致伸缩效应引起的BST膜的压电性。串联谐振频率与dc偏置密切相关,并且随着dc偏置的增大而向下移动,而并联谐振频率仅与dc偏置弱相关,并且略有偏移在低直流偏置(<45 V)时向上,而在较高直流偏置时向下。在串联谐振频率下,位移的相对可调性约为-2.3%,在60V直流偏置下,机电耦合系数高达约8.09%,这表明可以通过使用钼(Mo)作为布拉格反射器中的高声阻抗层来获得高质量的可调谐BST FBAR器件,其中n它不仅可以提供与基材的出色隔音效果,而且还可以提高BST膜的结晶度,并具有更高的沉积温度。

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  • 来源
    《中国物理:英文版》 |2012年第10期|369-374|共6页
  • 作者单位

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

    State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
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