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Studies on the polycrystalline silicon/SiO2 stack as front surface field for IBC solar cells by two-dimensional simulations

机译:二维模拟研究IBC太阳能电池的多晶硅/ SiO2叠层作为前表面场

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摘要

Interdigitated back contact (IBC) solar cells can achieve a very high efficiency due to its less optical losses.But IBC solar cells demand for high quality passivation of the front surface.In this paper,a polycrystalline silicon/SiO2 stack structure as front surface field to passivate the front surface of IBC solar cells is proposed.The passivation quality of this structure is investigated by two dimensional simulations.Polycrystalline silicon layer and SiO2 layer are optimized to get the best passivation quality of the IBC solar cell.Simulation results indicate that the doping level of polycrystalline silicon should be high enough to allow a very thin polycrystalline silicon layer to ensure an effective passivation and small optical losses at the same time.The thickness of SiO2 should be neither too thin nor too thick,and the optimal thickness is 1.2 nm.Furthermore,the lateral transport properties of electrons are investigated,and the simulation results indicate that a high doping level and conductivity of polycrystalline silicon can improve the lateral transportation of electrons and then the cell performance.
机译:指叉背接触式(IBC)太阳能电池由于其光损耗较小,因此可以实现非常高的效率。但是IBC太阳能电池需要对正面进行高质量的钝化处理。本文以多晶硅/ SiO2堆叠结构为前表面场通过二维仿真研究了该结构的钝化质量,优化了多晶硅层和SiO2层,使IBC太阳能电池具有最佳的钝化质量,仿真结果表明多晶硅的掺杂水平应足够高,以允许非常薄的多晶硅层同时确保有效的钝化和较小的光学损耗.SiO2的厚度不应太薄也不能太厚,最佳厚度为1.2此外,研究了电子的横向传输特性,仿真结果表明高掺杂水平多晶硅的电导率和电导率可以改善电子的横向传输,进而改善电池性能。

著录项

  • 来源
    《中国物理:英文版》 |2017年第8期|481-490|共10页
  • 作者单位

    Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

    University of Chinese Academy of Sciences, Beijing 100049, China;

    Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

    Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

    Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

    Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

    Jiangxi Science & Technology Normal University, Nanchang 330013, China;

    Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 eng
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