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Accuracy design of ultra-low residual reflection coatings for laser optics

机译:激光光学用超低残留反射膜的精度设计

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摘要

Refractive index inhomogeneity is one of the important characteristics of optical coating material,which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating.In the normal structure of antireflection coatings for center wavelength at 532 nm,the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm,respectively.The residual reflectance caused by refractive index inhomogeneity (the degree of inhomogeneous is between-0.2 and 0.2) is about 200 ppm,and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm.A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings,which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers.When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively,the residual reflectance increase from zero to 0.0769% at 532 nm.According to the above accuracy numerical method,if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm,residual reflectance of thin film will achieve to 2.06 ppm.When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and-0.05 respectively,the residual reflectance increase from zero to 0.0784% at 532 nm.The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.
机译:折射率不均匀性是光学涂层材料的重要特性之一,它是除利用折射率不均匀性获得梯度折射率涂层外,对超低残留反射涂层产生损耗的关键因素之一。中心波长为532 nm的抗反射涂层,H层和L层的物理厚度分别为22.18 nm和118.86 nm。由折射率不均匀(不均匀度在-0.2到0.2之间)引起的剩余反射率约为200 ppm,最小反射波长在528.2 nm至535.2 nm之间。提出了一种新的数值方法,在光谱计算中增加了折射率的不均匀性,从而设计出了激光减反射膜,从而可以实现残留反射为ppm的减反射膜的设计。调整耦合层的物理厚度。当la的折射率不均匀时H和L层分别为-0.08和0.05,在532 nm处残留反射率从零增加到0.0769%。根据上述精度数值方法,如果H层的物理厚度增加1.30 nm,L的层厚度减小4.50 nm,薄膜的剩余反射率将达到2.06 ppm。当H层和L层的折射率不均匀度分别为0.08和-0.05时,在532 nm处的剩余反射率将从零增加到0.0784%。通过减小1.55nm的层H而增加4.94nm的层L,可以将薄膜减小到0.8ppm。

著录项

  • 来源
    《中国物理:英文版》 |2017年第7期|393-398|共6页
  • 作者单位

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

    National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin 150080, China;

    National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin 150080, China;

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

    National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin 150080, China;

    Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China;

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

    National Key Laboratory of Science and Technology on Tunable Laser, Institute of Opto-electronics, Harbin Institute of Technology, Harbin 150080, China;

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

    Tianjin Key Laboratory of Optical Thin Film, Tianjin Jinhang Technical Physics Institute, HIWING Technology Academy of CASIC, Tianjin 300308, China;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 eng
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