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High quality factor superconducting coplanar waveguide fabricated with TiN

机译:TiN制成的高质量因子超导共面波导

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摘要

We fabricated TiN coplanar waveguides using standard lithography techniques followed by ICP etch.In order to achieve high quality factor,we investigated the film growth by choosing different deposition conditions for various substrates.Quality factors of waveguide resonators were measured at 20 mK in both high and low microwave power limits.An inner quality factor of several million was achieved at high power limit for a predominantly (200)-oriented TiN film which was grown on HF cleaned silicon wafer.A quality factor of larger than one million was achieved at high power limit for TiN film grown on sapphire.
机译:我们使用标准的光刻技术和ICP蚀刻技术制造了TiN共面波导。为了获得高品质因数,我们通过为各种衬底选择不同的沉积条件来研究膜的生长。在20 mK的高和高通量下测量了波导谐振器的质量因数低微波功率限制。在高功率限制下,以(200)取向的TiN薄膜在HF清洁的硅晶片上生长时,达到了几百万的内部质量因子。蓝宝石上生长的TiN膜的极限。

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  • 来源
    《中国物理:英文版》 |2017年第5期|11-15|共5页
  • 作者单位

    National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China;

    Key Laboratory of Quantum Information, University of Science and Technology of China, Hefei 230026, China;

    National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China;

    National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China;

    Synergetic Innovation Center of Quantum Information & Quantum Physics, University of Science and Technology of China, Hefei 230026, China;

    National Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093, China;

    Synergetic Innovation Center of Quantum Information & Quantum Physics, University of Science and Technology of China, Hefei 230026, China;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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