首页> 外文期刊>中国物理:英文版 >First-principles investigations of proton generation in α-quartz
【24h】

First-principles investigations of proton generation in α-quartz

机译:α-石英中质子产生的第一性原理研究

获取原文
获取原文并翻译 | 示例
       

摘要

Proton plays a key role in the interface-trap formation that is one of the primary reliability concerns,thus learning how it behaves is key to understand the radiation response of microelectronic devices.The first-principles calculations have been applied to explore the defects and their reactions associated with the proton release in α-quartz,the well-known crystalline isomer of amorphous silica.When a high concentration of molecular hydrogen (H2) is present,the proton generation can be enhanced by cracking the H2 molecules at the positively charged oxygen vacancies in dimer configuration.If the concentration of molecular hydrogen is low,the proton generation mainly depends on the proton dissociation of the doublyhydrogenated defects.In particular,a fully passivated E2' center can dissociate to release a proton barrierlessly by structure relaxation once trapping a hole.This research provides a microscopic insight into the proton release in silicon dioxide,the critical step associated with the interface-trap formation under radiation in microelectronic devices.
机译:质子在界面陷阱形成中起着关键作用,界面陷阱的形成是主要的可靠性问题之一,因此了解其行为是了解微电子器件的辐射响应的关键。第一性原理计算已被用于探索缺陷及其缺陷。与非晶态二氧化硅的众所周知的晶体异构体α-石英中的质子释放相关的反应。当存在高浓度的分子氢(H2)时,可通过在带正电的氧处裂解H2分子来增强质子的产生如果分子氢的浓度低,质子的产生主要取决于双氢化缺陷的质子解离。特别是,一个完全钝化的E2'中心一旦俘获a可以通过结构弛豫无障碍地解离释放质子。这项研究提供了对二氧化硅中质子释放的微观见解,这是与之相关的关键步骤微电子器件在辐射下具有界面陷阱的形成。

著录项

  • 来源
    《中国物理:英文版》 |2018年第3期|368-375|共8页
  • 作者

    Yunliang Yue; Yu Song; Xu Zuo;

  • 作者单位

    College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300071, China;

    Microsystem and Terahertz Research Center, China Academy of Engineering Physics, Chengdu 610200, China;

    Institute of Electronic Engineering, China Academy of Engineering Physics, Mianyang 621999, China;

    College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300071, China;

    Municipal Key Laboratory of Photo-electronic Thin Film Devices and Technology, Nankai University, Tianjin 300071, China;

  • 收录信息 中国科学引文数据库(CSCD);中国科技论文与引文数据库(CSTPCD);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号