Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography

摘要

Direct-write atom lithography,one of the potential nanofabrication techniques,is restricted by some difficulties in producing optical masks for the deposition of complex structures.In order to make further progress,a structured mirror array is developed to transversely collimate the chromium atomic beam in two dimensions.The best collimation is obtained when the laser red detunes by natural line-width of transition 7S3 → 7P40 of the chromium atom.The collimation ratio is 0.45 vertically(in x axis),and it is 0.55 horizontally(in y axis).The theoretical model is also simulated,and success of our structured mirror array is achieved.