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Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry

机译:高分辨率电感耦合等离子体质谱法定量分析高纯钴中的痕量杂质

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摘要

An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of Be, Mg, Al, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn, Sb, Ba, Pt, Au and Pb in high purity cobalt was described. Sample digestions were performed in closed microwave vessels using HNO3 and HCl. The matrix effects due to thc presence of excess HCl and Co were evaluated. The usefulness of high mass resolution for overcoming some spectral interference was demonstrated. The optimum conditions for the determination was tested and discussed. Correction for matrix effects, Sc, Rh and Bi were used as internal standards. The detection limits is 0.003-0.57 μg/g, the recovery ratio is 92.2%- 111.2%, and the RSD is less than 3.6%. The method is accurate, quick and convenient. It has been applied to the determination of trace impurities in high purity cobalt with satisfactory results.
机译:一种使用高分辨率电感耦合等离子体质谱(HR-ICP-MS)的分析方法,用于快速同时测定Be,Mg,Al,Ti,V,Cr,Mn,Fe,Ni,Cu,Zn,Ga,Ge,As描述了高纯度钴中的Se,Mo,Ag,Cd,Sn,Sb,Ba,Pt,Au和Pb。使用HNO3和HCl在封闭的微波容器中进行样品消化。评估了由于存在过量的HCl和Co而引起的基质效应。证明了高质量分辨率对于克服某些光谱干扰的有用性。测试和讨论了确定最佳条件。校正基质效应,将Sc,Rh和Bi用作内标。检出限为0.003-0.57μg/ g,回收率为92.2%-111.2%,RSD小于3.6%。该方法准确,快速,方便。该方法已用于高纯度钴中痕量杂质的测定,结果令人满意。

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