Fluidized chemical vapor deposition (FCVD) technology was developed for coating SnO 2 thin film on ultrafine Al 2O 3 particles.Transmission electron microscopy (TEM) and high resolution electron microscopy (HREM) analyses demonstrated that SnO 2 films with different structures were deposited through controlling the coating temperature, reactant concentration, etc .. Nanocrystalline SnO 2 film was formed at 572.15K by gas phase reaction of SnCl 4 and H 2O.Electron probe microanalyser (EPMA) and energy dispersive spectrometer (EDS) analyses indicated that the distribution of nanocrystalline SnO 2 over inner and outer part of the Al 2O 3 agglomerates was homogeneous.
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