A high entropy silicide by reactive spark plasma sintering

摘要

A high-entropy silicide(HES),(Ti_(0.2) Zr_(0.2) Nb_(0.2) Mo_(0.2) W_(0.2))Si_2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 ℃ for 15 min.The elements in this HES are uniformly distributed in the specimen based on the energy dispersive spectrometer analysis except a small amount of zirconium that is combined with oxygen as impurity particles. The Young's modulus, Poisson's ratio,and Vickers hardness of the obtained(Ti_(0.2) Zr_(0.2) Nb_(0.2) Mo_(0.2) W_(0.2))Si_2 are also measured.