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Deformation behavior of amorphous silicon nanostructures under monotonic and cyclic loading.

机译:在单调和循环载荷下非晶硅纳米结构的变形行为。

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摘要

An atomic force microscope was used to characterize the deformation behavior of amorphous silicon nanostructures subjected to monotonic and cyclic loading. The sample geometry was specially designed using finite element modeling for the purpose of these tests and the samples were grown by the oblique angle vapor deposition technique. These nanostructures are either in the form of a slanted nanorod or in the shape of an elbow. These structures were isolated from each other and were grown on tungsten nano-pillars arranged in either square or triangular pattern on Si(100) substrate. Various samples with different dimensions and rise angles were grown and tested in bending using the atomic force microscope.;The slanted nanorod specimens were tested in bending using the tip of an atomic force microscope cantilever and the mechanical response (force-displacement curve) was also measured. For small stresses/deflections the slanted nanorod specimens exhibited an elastic response consistent with the bulk amorphous silicon behavior. Since, samples with various dimensions and geometries were available; the Young's modulus was calculated from the slope of the experimentally observed stiffness versus the geometrical factor. This was done to reduce the uncertainty from just one sample. The Young's modulus for the amorphous silicon measured from the slope of the nanorod stiffness versus the geometric factor was found to be (94 +/- 10) GPa.;When the slanted nanorods were tested beyond the elastic limit in order to investigate the plastic properties of the amorphous silicon, the interface between the amorphous silicon and the tungsten failed before reaching the yield point and the eventual plastic deformation (if any) due to the high stress concentration in the region of the joint between the nanorod and the tungsten pillar. With this observation, it was concluded that nanostructures of alternative geometry where the stress is concentrated in the region other than the interface are needed for the characterization of plastic deformation and the failure properties of the nanostructures.;Finite element analysis of different test structures showed that in an elbow structure, the stress is concentrated around the turning point of the elbow, a region different from the interface of the amorphous silicon and the tungsten. The elbow structure was then grown using the oblique angle vapor deposition with swing rotation technique and tested under monotonic and cyclic loading conditions using the atomic force microscope.;When deformed monotonically at room temperature, the amorphous silicon specimens in the form of an elbow exhibited a linear force-displacement response up to a critical force/stress and a nonlinear response at forces larger than the critical force, a phenomenon not observed in bulk silicon. Since the amorphous silicon nanostructures exhibited a nonlinear deformation behavior during monotonic bending tests, a natural quest began whether these structures exhibit fatigue susceptibility, a phenomenon not observed in the bulk silicon. Since no any reliable fatigue testing technique for the nanoscale specimens existed, a method based on a continuous acquisition of force-displacement curves using atomic force microscope was established. With this method, the number of loading-unloading cycles needed for a complete failure of the specimen could be exactly counted by looking at the instability in the force-displacement curve which results in double peaks.;With the established fatigue test method for nanostructures based on the atomic force microscope, the elbow structures made of amorphous silicon were tested with different force amplitudes and the fatigue life curve (Wohler curve) was obtained. The fatigue life of the amorphous silicon specimens was observed to increase by five orders of magnitude with a 50% reduction in the applied force amplitude. By monitoring the stiffness of the elbow in subsequent cyclic loadings, it was verified that this delayed failure is due to progressive damage accumulation during cyclic loading, a surprising conclusion for a nanoscale specimen.;Despite the nonlinear deformation behavior observed from the monotonic loading tests and the progressive damage accumulation observed during the cyclic loadings of the amorphous silicon nanostructures, the scanning electron microscope images of the fracture surfaces could not point out concrete evidence if the failure was of ductile in nature. The finite element analysis of the stress distribution on the elbow structure due to a static end load revealed that, both principal and the shear stress is located around the turning point of elbow. Also, the magnitudes of the maximum principal stress (responsible for brittle failure) and the maximum shear stress (responsible for ductile failure) are relatively similar.
机译:原子力显微镜用来表征非晶硅纳米结构在单调和循环载荷下的变形行为。为了进行这些测试,使用有限元模型对样品的几何形状进行了专门设计,并通过倾斜角气相沉积技术生长了样品。这些纳米结构要么是倾斜的纳米棒的形式,要么是肘形的。这些结构彼此隔离,并在Si(100)基板上以正方形或三角形图案排列的钨纳米柱上生长。使用原子力显微镜生长各种尺寸和上升角度不同的样品并进行弯曲测试;使用原子力显微镜悬臂的尖端对倾斜的纳米棒样品进行弯曲测试,并且还获得了机械响应(力-位移曲线)测量。对于较小的应力/挠度,倾斜的纳米棒样品表现出与整体非晶硅行为一致的弹性响应。由于可以提供各种尺寸和几何形状的样品。杨氏模量由实验观察到的刚度与几何因子的斜率计算得出。这样做是为了减少仅一个样本的不确定性。由纳米棒刚度的斜率与几何因子的比值测得的非晶硅的杨氏模量为(94 +/- 10)GPa .;当测试倾斜的纳米棒超出弹性极限以研究其塑性时在无定形硅中,由于在纳米棒和钨柱之间的接合区域中的高应力集中,非晶硅和钨之间的界面在到达屈服点之前发生了破坏,并最终发生了塑性变形(如果有的话)。根据这一观察结果,得出结论,需要用应力替代集中在界面以外区域的替代几何结构的纳米结构来表征塑性变形和纳米结构的破坏特性。;对不同测试结构的有限元分析表明:在弯头结构中,应力集中在弯头的拐点附近,该区域与非晶硅和钨的界面不同。然后使用倾斜角气相沉积和旋转旋转技术生长弯管结构,并使用原子力显微镜在单调和循环载荷条件下进行测试;;在室温下单调变形时,呈弯头形式的非晶硅试样显示出线性力-位移响应直至临界力/应力,以及在大于临界力的力下呈现非线性响应,这种现象在体硅中未观察到。由于非晶硅纳米结构在单调弯曲试验中表现出非线性变形行为,因此自然开始寻求这些结构是否表现出疲劳敏感性,这在块状硅中未观察到。由于不存在任何可靠的纳米级标本疲劳测试技术,因此建立了一种基于原子力显微镜连续获取力-位移曲线的方法。通过这种方法,通过观察力-位移曲线中的不稳定性会导致双峰,可以准确地计算出试样完全失效所需的加载-卸载循环次数。在原子力显微镜上,用不同的力幅对非晶硅制成的肘形结构进行了测试,得出了疲劳寿命曲线(Wohler曲线)。观察到非晶硅样品的疲劳寿命增加了五个数量级,而施加的力幅值降低了50%。通过监测后续循环载荷中肘部的刚度,证实了这种延迟失效是由于循环载荷过程中渐进性损伤积累引起的,这对于纳米级标本来说是令人惊讶的结论。如果在非晶硅纳米结构的循环加载过程中观察到渐进式损伤积累,则断裂表面的扫描电子显微镜图像无法指出具体的证据,即该失效本质上是韧性的。有限的静态端载荷对弯头结构应力分布的有限元分析表明,主应力和剪应力都位于弯头的转折点附近。同样,最大主应力(负责脆性破坏)和最大剪切应力(负责延性破坏)的大小相对相似。

著录项

  • 作者

    Gaire, Churamani.;

  • 作者单位

    Rensselaer Polytechnic Institute.;

  • 授予单位 Rensselaer Polytechnic Institute.;
  • 学科 Engineering Mechanical.;Physics Condensed Matter.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2008
  • 页码 105 p.
  • 总页数 105
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 机械、仪表工业;工程材料学;
  • 关键词

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