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Adsorption, photocatalysis, and photochemistry of trace level aqueous mercury.

机译:痕量水银的吸附,光催化和光化学。

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摘要

Mercury (Hg) is ubiquitous in the environment and can lead to detrimental impacts for humans and ecosystems. From the literature, semiconductor photocatalysis showed promise as an aqueous Hg removal technology. To further this concept, high surface area photocatalytic adsorbents, SiO2/TiO2 composites (STC), were synthesized by adding TiO2nanoparticles to a liquid sol that was catalyzed by HNO3 and HF acids. The resulting materials were characterized by SEM, nitrogen adsorption-desorption, streaming potential, XRD, diffuse reflectance and TiO2surface area analyses. Approximate characteristics include an isoelectric point of 3, TiO2particle size of 30 nm, and a band gap energy of 3.2 eV. Surface areas of the composites ranged from 167 to 630 m2/g. Available TiO2surface area of the composite was dependent upon TiO2loading.;STCs and their precursors, silica and Degussa P25 TiO2, were applied to trace level Hg solutions (100 mug/L Hg) to determine the degree of Hg removal that could be accomplished via adsorption and photocatalysis. Under adsorption alone, STCs were able to achieve approximately 90% Hg removal. Silica without TiO2performed poorly and was not affected by UV illumination. Additionally, Hg removal was optimized by altering primary particle size, STC pore size, and TiO2loading. Contrary to expectations, the performance of DP25 was not significantly improved by UV irradiation and the performance of the STC was degraded under the same conditions. Elemental Hg was formed under UV irradiation due to photochemical reactions, decreasing the Hg removal by STC.;Photochemical transformations of Hg in batch reactors were investigated. The effect of purge gas (including rate and bubble size), UV irradiation wavelength, initial Hg concentration and time on Hg removal from prepared solutions were studied. Nitrogen purge with 254 nm UV irradiation resulted in the greatest net production of elemental Hg following a pseudo first order rate constant of 0.18 s-1 reaching over 99% removal. As oxygen was introduced into solution, the quantity of elemental Hg volatilized decreased but still resulted in significant Hg losses through volatilization up to 90% in 60 minutes. Most importantly, the loss of elemental Hg from solution is dependent upon the gas purge rate and bubble size.
机译:汞(Hg)在环境中无处不在,并且可能对人类和生态系统造成不利影响。从文献来看,半导体光催化技术有望作为一种去除汞的技术。为了进一步推广这一概念,通过将TiO2纳米粒子添加到被HNO3和HF酸催化的液态溶胶中,合成了高表面积的光催化吸附剂SiO2 / TiO2复合材料(STC)。通过SEM,氮吸附-解吸,流电势,XRD,漫反射率和TiO 2表面积分析对所得材料进行表征。近似特性包括等电点为3,TiO2粒径为30 nm和带隙能为3.2 eV。复合材料的表面积为167至630平方米/克。复合材料的可用TiO2表面积取决于TiO2的负载量。将STC及其前体,二氧化硅和Degussa P25 TiO2应用于痕量汞溶液(100 mug / L Hg),以确定可通过吸附去除汞的程度和光催化。仅在吸附作用下,STC就能去除约90%的汞。不含TiO2的二氧化硅的性能较差,不受紫外线照射的影响。此外,通过改变一次粒径,STC孔径和TiO2含量优化了汞的去除。与预期相反,在相同条件下,UV辐射并未显着改善DP25的性能,而STC的性能却下降了。由于光化学反应,紫外线照射下会形成单质汞,从而减少了STC去除汞的可能性。研究了间歇反应器中汞的光化学转化。研究了吹扫气体(包括速率和气泡大小),紫外线照射波长,初始汞浓度和时间对制备溶液中汞去除的影响。 254 nm UV辐射进行的氮气吹扫导致最大的净元素汞生成,其伪一级速率常数为0.18 s-1,达到了99%以上的去除率。当将氧气引入溶液中时,挥发性元素汞的量减少,但仍会通过挥发在60分钟内高达90%导致大量的汞损失。最重要的是,溶液中元素Hg的损失取决于气体吹扫速率和气泡大小。

著录项

  • 作者

    Byrne, Heather Elizabeth.;

  • 作者单位

    University of Florida.;

  • 授予单位 University of Florida.;
  • 学科 Engineering Environmental.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 149 p.
  • 总页数 149
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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