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Behavior of vacuum switching devices for short gaps.

机译:真空开关设备的特性,适用于短间隙。

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The behavior of vacuum switching devices has been studied for short gap lengths. Reignition phenomena and events associated with high frequency arc quenching have been of particular interest.; When used for switching inductive loads, vacuum interrupters can generate excessive transients, frequently in the form of multiple reignitions leading to voltage escalation. The magnitude of the overvoltage depends on the circuit parameters, circuit configuration, and the properties of the switching device. Circuit related data, obtained from experimental tests, was included in the study. The main effort in this phase of the work concentrated on the properties of vacuum devices.; Two of these properties dominate the escalation process: the breakdown strength characteristic as a function of time, and the high frequency current clearing capability. While the breakdown strength characteristic is mainly a feature of the contact travel and physical properties of the contact material and the contact surface, the second property, high frequency current clearing capability, depends on complex vacuum arc physics. A computer program was developed which used this data to predict the amount of overvoltage to a reasonable level of accuracy. The experiments showed considerable differences among commercially available vacuum interrupters.; To gain the physical insight into what is happening during a high frequency reignition in vacuum, a theoretical model has been proposed in which the arc plasma is presented as a compressible fluid, obeying conservation laws of mass, momentum, and energy, and the principle of current continuity.; By solving a set of simultaneous equations a novel computer program provides data for the distributions of: ion density and velocity, electric field, and potential, along with the ion sheath parameters, in the interelectrode space.; A comparison between test and computer generated results indicates that ionization of residual metal vapor after a hf current zero can accompany the diffusive decay of arc plasma. The simulation study has also revealed that the electric field distribution exhibits a local maximum at the anode of the discharge some tens of nanoseconds after the ion sheath forms during the post arc period. This phenomenon may be responsible for the early breakdowns across the sheath. It depends on the plasma/circuit parameters and is not always present.
机译:对于短的间隙长度,已经研究了真空开关装置的性能。与高频电弧熄灭有关的重燃现象和事件已引起特别关注。当用于开关感性负载时,真空灭弧室会产生过多的瞬变,经常以多次复燃的形式导致电压升高。过电压的大小取决于电路参数,电路配置和开关设备的属性。从实验测试中获得的电路相关数据也包括在研究中。在这一阶段的工作主要集中在真空装置的性能上。这些特性中的两个控制着升级过程:击穿强度特性随时间的变化以及高频电流清除能力。击穿强度特性主要是接触材料和接触表面的接触行程和物理特性的特征,而第二特性(高频电流清除能力)则取决于复杂的真空电弧物理学。开发了一个计算机程序,使用该数据可以将过电压的数量预测到合理的精度水平。实验表明,市售的真空灭弧室之间存在很大差异。为了从物理上了解真空中高频点火期间发生的情况,提出了一种理论模型,其中将电弧等离子体表示为可压缩流体,并遵循质量,动量和能量的守恒定律,以及当前的连续性。通过求解一组联立方程,一个新颖的计算机程序为电极间空间中的离子密度和速度,电场和电势以及离子鞘参数的分布提供了数据。测试结果和计算机生成结果之间的比较表明,高频电流为零后残留金属蒸气的电离可伴随电弧等离子体的扩散衰减。模拟研究还表明,在电弧放电后的离子鞘层形成后数十纳秒内,电场分布在放电阳极处表现出局部最大值。这种现象可能是造成鞘管早期破裂的原因。它取决于等离子/电路参数,并不总是存在。

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