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Development of photovoltaic cells on electrodeposited copper indium selenide films.

机译:在电沉积铜铟硒化物薄膜上开发光伏电池。

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摘要

Using polycrystalline thin films of CuInSe{dollar}sb2{dollar} (thickness 1.5 {dollar}mu{dollar}m) prepared by an electrodeposition method, photovoltaic cells of the form ZnO/CdS/CuInSe{dollar}sb2{dollar} have been fabricated and studied. Before the cell fabrication, properties of the electrodeposited CuInSe{dollar}sb2{dollar} were first studied. Conditions for the preparation of high resistivity CdS thin films (thickness 360 A) by a chemical bath deposition method were then established. This was achieved by varying the deposition temperature and amount of NH{dollar}sb4{dollar}OH in the solution. It was observed that the quality of CdS films deposited at a temperature of 60{dollar}spcirc{dollar}C and an NH{dollar}sb4{dollar}OH concentration of 0.48 M was the best. Thermal stability of low resistivity, In- or Ar-doped, rf-sputtered ZnO thin films (thickness 1{dollar}mu{dollar}m) was also studied. This was done by heat treating the ZnO films in air, O{dollar}sb2{dollar} and N{dollar}sb2{dollar} at temperature in a range from 200 to 350{dollar}spcirc{dollar}C. It was observed that the amount of increase of resistivity at a given temperature decreased as the doping concentration was increased from 0.5 to 5.3 wt.%. For the films containing 2 wt.% In or Al, the resistivity increased as the treating temperature was increased from 200 to 350{dollar}spcirc{dollar}C. For the samples treated at 200{dollar}spcirc{dollar}C, the increase in resistivity was about 1 order of magnitude.; The high resistivity CdS and low resistivity ZnO thin films were then deposited on electrodeposited CuInSe{dollar}sb2{dollar} to fabricate cells of the form ZnO/CdS(high {dollar}rho{dollar})/CuInSe{dollar}sb2{dollar}. For comparison, cells of CdS(low {dollar}rho{dollar})/CdS(high {dollar}rho{dollar})/CuInSe{dollar}sb2{dollar} were also fabricated by evaporation of low resistivity CdS. The CuInSe{dollar}sb2{dollar} films used were treated either in vacuum or Ar. For those treated in vacuum, very poor properties were observed. The properties improved after a post fabrication heat treatment in air, however, the efficiency of these cells was below 2%. The low conversion efficiency was due to the low open circuit voltage. From capacitance-voltage measurements, this was found to be due to a high acceptor concentration on the surface of the vacuum treated CuInSe{dollar}sb2{dollar} films (10{dollar}sp{lcub}17{rcub}{dollar} cm{dollar}sp{lcub}-3{rcub}{dollar}). For the cells fabricated on the CuInSe{dollar}sb2{dollar} films treated in Ar, photovoltaic effects were present before the air heat treatment. An efficiency of 6.8% was obtained for one of the best cells, sample J8-4 (with low resistivity CdS window). For cells with ZnO window, a conversion efficiency of 6.3% was obtained (cell O51). For these cells, the acceptor concentration in CuInSe{dollar}sb2{dollar} was 10{dollar}sp{lcub}16{rcub}{dollar} cm{dollar}sp{lcub}-3{rcub}{dollar}, which was one order of magnitude lower than that of CuInSe{dollar}sb2{dollar} films treated in vacuum.; The diffusion length of minority carriers (electrons) in the electrodeposited, p-type CuInSe{dollar}sb2{dollar} was first measured using the photocurrent and capacitance methods. For the vacuum treated CuInSe{dollar}sb2{dollar} films, the electron diffusion length was small (less than 0.1 {dollar}mu{dollar}m). For those treated in Ar, values of the electron diffusion length were about 0.5 {dollar}mu{dollar}m. These values are close to those reported for evaporated CuInSe{dollar}sb2{dollar} thin films.; Some of the fabricated cells were also studied using an electron beam induced current (EBIC) method. From the EBIC experiments, the effective diffusion lengths of electrons with values greater than 1 {dollar}mu{dollar}m were obtained. Considering the surface recombination effect, the electron diffusion length of the electrodeposited CuInSe{dollar}sb2{dollar} was finally found to be 2.4 {dollar}mu{do
机译:使用通过电沉积方法制备的CuInSe {dollar} sb2 {dollar}(厚度为1.5 {dollar} mu {dollar} m)的多晶薄膜,已经形成了ZnO / CdS / CuInSe {dollar} sb2 {dollar}形式的光伏电池。捏造和研究。在电池制造之前,首先研究了电沉积的CuInSe {dollar} sb2 {dollar}的性能。然后建立了通过化学浴沉积法制备高电阻率CdS薄膜(厚度360 A)的条件。这是通过改变沉积温度和溶液中NH {sb4sb4 {dollar} OH的含量来实现的。观察到,在60℃的温度和0.48M的NH 3的sb 4 OH的浓度下沉积的CdS膜的质量是最好的。还研究了低电阻率,In或Ar掺杂,rf溅射的ZnO薄膜(厚度为1 {dollar} mu {dollar} m)的热稳定性。这是通过在空气中以200到350℃的温度下对ZnO膜进行热处理的方法来完成的,这些ZnO膜在空气,Osbsb2 {dollar}和N {dollarssb2 {dollar}中。观察到,在给定温度下电阻率的增加量随着掺杂浓度从0.5重量%增加到5.3重量%而减小。对于包含2重量%的In或Al的膜,电阻率随着处理温度从200℃增加到350℃而提高。对于在200℃下进行处理的样品,电阻率的增加约为1个数量级。然后将高电阻率的CdS和低电阻率的ZnO薄膜沉积在电沉积的CuInSe {dollar} sb2 {dollar}上,以制造ZnO / CdS(high {dollar} rho {dollar})/ CuInSe {dollar} sb2 {dollar }。为了比较,还通过蒸发低电阻率的CdS来制备CdS(低美元)/ CdS(高美元)/ CuInSe(sb2)美元的电池。所用的CuInSe {dollar} sb2 {dollar}膜在真空或氩气中进行处理。对于在真空中处理的那些,观察到非常差的性能。在空气中进行后期制造热处理后,性能得到改善,但是这些电池的效率低于2%。低的转换效率是由于低的开路电压。从电容电压测量中,发现这是由于真空处理的CuInSe {dollar} sb2 {dollar}薄膜表面上的受体浓度高(10 {dollar} sp {lcub} 17 {rcub} {dollar} cm {dollar} sp {lcub} -3 {rcub} {dollar})。对于在Ar中处理过的CuInSe {dollar} sb2 {dollar}薄膜上制造的电池,在空气热处理之前存在光电效应。对于最好的电池之一,样品J8-4(具有低电阻率CdS窗口),获得了6.8%的效率。对于具有ZnO窗口的电池,转换效率为6.3%(电池O51)。对于这些细胞,CuInSe {dollar} sb2 {dollar}中的受体浓度为10 {dollar} sp {lcub} 16 {rcub} {dollar} cm {dollar} sp {lcub} -3 {rcub} {dollar},比真空处理的CuInSe {dollar} sb2 {dollar}薄膜低一个数量级。首先使用光电流和电容法测量电沉积的p型CuInSe {sb2 {dollar}中少数载流子(电子)的扩散长度。对于真空处理的CuInSe {sb2 {dollar}膜,电子扩散长度小(小于0.1 {μm}}。对于在Ar中处理的那些,电子扩散长度的值约为0.5muμm。这些值接近于蒸发的CuInSe {sb2 {s}}薄膜的报道值。还使用电子束感应电流(EBIC)方法研究了一些制造的电池。从EBIC实验中,获得了电子的有效扩散长度,其值大于1 {μm}μm。考虑到表面复合效应,电沉积CuInSe {dollar} sb2 {dollar}的电子扩散长度最终为2.4 {dollar} mu {do

著录项

  • 作者

    Qiu, Chunong.;

  • 作者单位

    McGill University (Canada).;

  • 授予单位 McGill University (Canada).;
  • 学科 Engineering Electronics and Electrical.; Energy.
  • 学位 Ph.D.
  • 年度 1995
  • 页码 233 p.
  • 总页数 233
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;能源与动力工程;
  • 关键词

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