首页> 外文学位 >Fabrication and characterization of a planar high temperature superconducting multichip module utilizing YBa(2)Cu(3)O(7-x) interconnects.
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Fabrication and characterization of a planar high temperature superconducting multichip module utilizing YBa(2)Cu(3)O(7-x) interconnects.

机译:利用YBa(2)Cu(3)O(7-x)互连的平面高温超导多芯片模块的制造和表征。

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摘要

In the development of high density, high speed multichip modules (MCMs), high temperature superconductor (HTS) interconnects are considered a viable alternative to normal metal interconnects for their low losses at high frequencies, high packing densities and reduced propagation delays. A superconducting MCM-D test module utilizing YBa2Cu3O7−δ (YBCO) high temperature superconductor (HTS) interconnects has been fabricated and tested to operate at liquid nitrogen temperature (77 K).; The MCM unit consists of two gallium arsenide high speed digital clock distribution die connected by YBCO interconnects to form a pair of ring oscillators on a 2.25 cm2 MCM-D substrate. The multilayer interconnection structure consists of two signal layers of YBCO (∼0.3 μm thick) separated by an YSZ (∼0.5 μm)/SiO2 (4–5 μm)/YSZ (∼0.5 μm) interlevel dielectric structure. The YSZ dielectric films deposited by ion beam assisted deposition (IBAD) serve as barrier layers to prevent interdiffusion between the SiO2 and YBCO from occurring while the top layer also acts as a buffer for the top YBCO film deposition. The module was designed using an interconnected mesh power system (IMPS) topology and, thereby, the signal interconnects and power and ground lines are fabricated in only two layers of YBCO. The signal interconnects have 50 μm linewidths and 75 μm spacings. Connection between the two layers of HTS interconnects through the YSZ/SiO2/YSZ dielectric multilayer is accomplished with low contact resistance 40 μm wide gold vias. A combination of wet and dry etching techniques are used to create the via openings and sputter deposited gold is used for connecting the YBCO interconnects through the vias. This technique for making vias provides a low resistivity contact (10−7 Ω-cm2) between the YBCO layers while maintaining excellent space efficiency. Chemical-mechanical polishing (CMP) has been used to create a planarized silicon dioxide surface for deposition of a high quality top layer of YBCO. Electrical connection between the die and the MCM substrate and between the substrate and the PC board was made using ultrasonic Al or thermosonic Au wire bonds to low contact resistance Au/YBCO bond pads on the MCM substrate.
机译:在高密度,高速多芯片模块(MCM)的开发中,高温超导体(HTS)互连被认为是普通金属互连的可行替代方案,因为它们在高频下具有低损耗,高封装密度并减少了传播延迟。制作了利用YBa 2 Cu 3 O 7−δ (YBCO)高温超导体(HTS)互连的超导MCM-D测试模块并经测试可在液氮温度(77 K)下运行。 MCM单元由通过YBCO互连连接的两个砷化镓高速数字时钟分配芯片组成,以在2.25 cm 2 MCM-D基板上形成一对环形振荡器。多层互连结构由两个YBCO信号层(约0.3μm厚)组成,中间隔开一个YSZ(〜0.5μm)/ SiO 2 (4-5μm)/ YSZ(〜0.5μm)层介电结构。通过离子束辅助沉积(IBAD)沉积的YSZ介电膜用作阻挡层,以防止SiO 2 和YBCO之间发生相互扩散,而顶层还充当顶部YBCO膜沉积的缓冲层。该模块是使用互连网状电源系统(IMPS)拓扑设计的,因此,仅在YBCO的两层中制造了信号互连以及电源线和地线。信号互连的线宽为50μm,间距为75μm。通过低接触电阻40μm宽的金通孔,可以通过YSZ / SiO 2 / YSZ电介质多层结构在HTS的两层互连之间进行连接。湿法和干法蚀刻技术的组合用于创建通孔开口,并使用溅射沉积的金来通过通孔连接YBCO互连。这种制造通孔的技术可在YBCO层之间提供低电阻率的接触(<10 −7 Ω-cm 2 ),同时保持出色的空间效率。化学机械抛光(CMP)已用于创建平面化的二氧化硅表面,以沉积高质量的YBCO顶层。管芯与MCM基板之间以及基板与PC板之间的电连接是使用超声Al或热超声Au引线键合至MCM基板上的低接触电阻Au / YBCO焊盘进行的。

著录项

  • 作者

    Cooksey, John Wayne.;

  • 作者单位

    University of Arkansas.;

  • 授予单位 University of Arkansas.;
  • 学科 Engineering Electronics and Electrical.
  • 学位 Ph.D.
  • 年度 2000
  • 页码 225 p.
  • 总页数 225
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 无线电电子学、电信技术;
  • 关键词

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