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Simultaneous control and identification for multiple product and process environments in semiconductor manufacturing.

机译:半导体制造中多个产品和工艺环境的同时控制和识别。

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It is typical in semiconductor manufacturing to see many different products being made by using a variety of process conditions on the same pieces of equipment. Because of the nature of the process conditions and the high cost of materials, it is very difficult and often impossible to obtain measurements of key process variables while the process is operating. Product wafers are run in batches on processing tools using recipes, which specify the parameters necessary to run the tool such as pressure, temperature, and processing time. Measurements are made after processing steps are completed in order to determine if batches meet their specifications. Run-to-run control methods use the measurement data available at the end of each run to determine better recipe settings for subsequent batches. This task is made more difficult by the fact that measurements are often confounded by several different possible sources of variation.; This research investigates a Kalman filter-based state estimation scheme that views a process area with all the tools, products, and processes it contains as a single interrelated system. This formulation maximizes the amount of information that is shared across different batches by capturing their common characteristics in common parameters. The estimation scheme performs state updates correctly even when measurement data is missing or delayed. A set of simulations are used to demonstrate the performance of the algorithm under different operating conditions.; The trace of the state error covariance matrix from the Kalman filter is used as a metric for determining the apparent value of a particular data set to the run-to-run control algorithm. Processing decisions such as batch scheduling, tool allocation, and sampling plans are shown to have an effect on controller performance. Algorithms using the state error covariance matrix are developed that can recommend ways to optimize the scheduling aspects of the factory in order to provide run-to-run control algorithms with the best possible information. Simulation results demonstrate that measurable improvements in state estimation and control output performance can be achieved by using information from the process controller to help make better scheduling and sampling decisions.
机译:在半导体制造中,通常会看到在同一台设备上使用各种工艺条件制造出许多不同的产品。由于过程条件的性质和材料的高昂成本,在过程运行期间很难获得关键过程变量的测量值,而且通常是不可能的。使用配方在处理工具上批量运行产品晶圆,该配方指定了运行工具所需的参数,例如压力,温度和处理时间。在处理步骤完成后进行测量,以确定批次是否符合其规格。逐次运行控制方法使用每次运行结束时可用的测量数据来确定后续批次的更好配方设置。由于测量常常被几种不同的可能变化源所混淆,这一任务变得更加困难。这项研究调查了一种基于卡尔曼滤波器的状态估计方案,该方案将一个过程域及其包含的所有工具,产品和过程视为一个相互关联的系统。通过在通用参数中捕获它们的通用特性,此公式可最大化不同批次之间共享的信息量。即使丢失或延迟了测量数据,估计方案也可以正确执行状态更新。一组模拟用来证明算法在不同操作条件下的性能。来自卡尔曼滤波器的状态误差协方差矩阵的轨迹用作确定特定数据集视在运行控制算法的表观值的度量。诸如批处理调度,工具分配和采样计划之类的处理决策显示对控制器性能有影响。开发了使用状态误差协方差矩阵的算法,这些算法可以推荐优化工厂调度方面的方法,以便为运行间控制算法提供最佳信息。仿真结果表明,通过使用过程控制器提供的信息来帮助做出更好的调度和采样决策,可以实现状态估计和控制输出性能的显着改善。

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