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Study of corrosion pits in chloride solution.

机译:研究氯化物溶液中的腐蚀点。

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摘要

A laser technique was used to initiate single corrosion pits as well as geometrically ordered arrays of pit on nickel (99.99%) immersed in 0.5 M NaCl solutions under potentiostatic condition. The current was measured during pit growth and the shape of each pit was recorded upon termination of each experiment. It was found that single pits had smooth surfaces and they were slightly shallower than hemispheres and for applied potentials between 0.5 and 0.6 V SCE, and for growth time greater than 20 s. Experimental measurements of pit radius and current density as a function of time at t ≤ 100 s agreed with calculations based on the hypothesis that the pit growth rate was limited by the diffusion controlled dissolution rate of a salt film. A transport model, which included both migration and diffusion, was used to interpret experimental results. The model predicted that the local environment inside the pit cavity was aggressive enough that a salt film might precipitate at the early stage of pit growth. Current interruption experiments demonstrated that pit stability was determined by the extent of relaxation of the pit environment. A critical concentration adjacent to the pit surface is required for the pit to maintain active. It was found to be independent of the pit size, but dependent on the applied potential. The critical applied potential above which pits continued to grow decreased with pit size. It was observed that the growth rate of pits at an applied potential of 0.5 V SCE decreased in the presence of flow, and pits repassivated at Pe number greater than 1000. A two-dimensional trench model predicted rinsing of cavity at Pe > 1000, which was in qualitative agreement with the experimental observations. Controlled multiple pits experiments demonstrated that pits do interact with each other within a critical distance. It was found that the neighboring pits enhanced the growth of the central pit in the lateral direction and the total current also increased under potentiostatic condition. The critical distance was affected by the bulk concentration of chloride.
机译:激光技术用于在恒电位条件下浸入0.5 M NaCl溶液中的镍(99.99%)上引发单个腐蚀坑以及坑的几何排列阵列。在凹坑生长期间测量电流,并且在每个实验结束时记录每个凹坑的形状。发现单个凹坑具有光滑的表面,并且比半球略浅,并且施加的电势介于0.5和0.6 V SCE之间,并且生长时间大于20 s。在t≤100 s时,随时间变化的凹坑半径和电流密度的实验测量结果与基于以下假设的计算相符:凹坑的生长速度受盐膜的扩散控制的溶解速度限制。运移模型,包括迁移和扩散,被用来解释实验结果。该模型预测,坑腔内的局部环境具有足够的侵蚀性,以至盐膜可能在坑生长的早期阶段沉淀出来。当前的中断实验表明,坑的稳定性取决于坑环境的松弛程度。为了保持活性,需要接近凹坑表面的临界浓度。发现它与凹坑尺寸无关,但取决于施加的电势。凹坑继续生长的临界应用电势随凹坑尺寸而减小。可以观察到,在存在流动的情况下,在施加0.5 V SCE的电位时,凹坑的生长速率降低,并且在Pe数大于1000时,凹坑会重新钝化。二维沟槽模型预测,在Pe> 1000时,腔会被冲洗。在质量上与实验观察一致。受控的多个凹坑实验表明,凹坑确实在临界距离内相互影响。已经发现,相邻的凹坑在横向上促进了中央凹坑的生长,并且在恒电位条件下总电流也增加了。临界距离受氯化物总浓度的影响。

著录项

  • 作者

    Zhu, Lei.;

  • 作者单位

    University of Illinois at Urbana-Champaign.;

  • 授予单位 University of Illinois at Urbana-Champaign.;
  • 学科 Engineering Materials Science.; Engineering Chemical.
  • 学位 Ph.D.
  • 年度 2002
  • 页码 253 p.
  • 总页数 253
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;化工过程(物理过程及物理化学过程);
  • 关键词

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