声明
1 Introduction
1.1 Introduction
1.2 Background of the Study
1.3 Amplitude-Only Holograms
1.4 Statement of the Study Problem
1.5 Significance of Research
1.6 Research Questions
1.7 Research Objectives
1.8 Thesis overview
2 Methodology
2.1 Introduction
2.2 Literature review
2.2.1 Metasurfaces
2.2.2 Nanohole Background
2.2.3 Surface Plasmon
2.3 Nanohole Amplitude-Only Metasurface Holography Procedure
2.4 Design and simulations
2.4.1 Mathematical Model
2.4.2 MATLAB
2.4.3 Lumerical FDTD
2.5 Fabrication
2.5.1 Electron Beam Lithography (EBL)
2.6 Characterization
2.6.1 Experimental Setup
2.6.2 Scanning Electron Microscopy
3 Design simulation and optimization
3.1 Introduction
3.2 Theoretical Background
3.2.1 Diffraction theories
3.2.2 Maxwell Equation
3.2.3 Maxwell’s equation solution
3.3 Overview of lumerical FDTD tools for simulation
3.3.1 Material
3.3.2 Simulation object
3.3.3 Structures
3.3.4 Groups
3.3.5 Attributes
3.3.6 Simulation
3.3.7 Import
3.3.8 Sources
3.3.9 Monitors
3.3.10 Optimizations and sweeps
3.3.11 Result analysis
3.3.11 Analysis groups
3.4 Design of Amplitude-Only Nanohole Metasurface
3.4.1 Design Process
3.4.2 Nanohole Design
3.3.4 Fraunhofer diffraction
3.4.5 Encoding of Design
3.4.6 FDTD Model Development
3.5 Results
4 Fabrication
4.1 Introduction
4.2 Theoretical Background
4.3 Clean room/Nanofabrication laboratory
4.3.1 Clean room suit
4.4 Silicon Wafer Substrate
4.5 Sample preparation
4.5.1 Spinning and coating resist
4.6 Fabrication Technique
4.6.1 EBL
4.6.2 Components of EBL
4.6.3 Etching
4.6.4 Metal Deposition and Lift-off
4.6.4 Thermal Evaporation
5 Conclusion
参考文献
Appendix A: Standard Operating Procedure: EBL
Appendix B:
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