Effect of metal contamination and improved cleaning strategies

摘要

The effect of different metallic contaminants on MOS structures is reviewed. Cleaning processes tend to consist of long sequences of individual steps. Each step is often performed in its own tank resulting in large equipment. It is the purpose of this work to introduce reduced cleaning with improved cleanliness performance. Also a lot of attention is devoted to final rinsing, particularly with respect to the risk of metal recontamination.