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Research of Semiconductor Bridge Plasma with Optical Technique

机译:用光学技术研究半导体桥等离子体

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Semiconductor Bridge (SCB) plasma was used as igniter of energetic materials and the characteristics of plasma were vital to understand the ignition mechanism. However, owing to little size and short duration, the research of SCB plasma was restricted. With optical method the component, radiation intensity, size and speed of SCB plasma were studied in this paper. The atomic emission spectra indicated that SCB plasma was comprised of aluminum and iron, copper, silicon atom and also copper and silicon ion. The radiation intensity increased greatly and reached the highest at the moment of 3 μs. Plasma radial and axial size were about 500–2 000 μm and then plasma speed were then induced. At the moment of 1 μs, the plasma speed in radial direction was about 1 km/s and speed in axial direction 0.7 km/s and reduced the minim at 5 μs. The results provided instruction for the SCB plasma chemical reaction analysis, bridge design and charge condition. Also, the analytical technique was suitable for other transient and small-size plasma system.
机译:半导体桥(SCB)等离子体用作高能材料的点火器,等离子体的特性对于理解点火机理至关重要。然而,由于其体积小,持续时间短,限制了SCB等离子体的研究。用光学方法研究了SCB等离子体的组成,辐射强度,尺寸和速度。原子发射光谱表明,SCB等离子体由铝和铁,铜,硅原子以及铜和硅离子组成。辐射强度大大增加,并在3 s的瞬间达到最高。血浆径向和轴向尺寸约为500-2 000μm,然后诱导血浆速度。在1μs的瞬间,径向的等离子速度约为1 km / s,轴向的速度为0.7 km / s,并且在5μs时减小了最小值。结果为SCB等离子体化学反应分析,电桥设计和充电条件提供了指导。同样,该分析技术适用于其他瞬态和小尺寸等离子体系统。

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