首页> 外文会议>Symposium on Science and Technology of Magnetic Oxides December 1-4, 1997, Boston, Massachusetts, U.S.A. >Effects of chromium ion implantation on the magneto-transport properties of La_(0.7)Ca_(0.3)MnO_3 thin films
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Effects of chromium ion implantation on the magneto-transport properties of La_(0.7)Ca_(0.3)MnO_3 thin films

机译:铬离子注入对La_(0.7)Ca_(0.3)MnO_3薄膜的磁输运性质的影响

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摘要

Thin films of colossal magnetoresistance material La_(0.7)Ca_(0.3)MnO_3 were implanted with different fluence 200keV Cr ions. Resistivty measurements in zero and applied fields of up to 8T were made in order to determine the effects of the implanted magnetic ions on the magnetoresistance (MR). As the Cr fluence was increased, the resistivity increased and the metal-insulator transition (MI) temperature was suppressed to values below the experimentally accessible temperature range as a result of oxygen loss and the creation of defects. However, for the highest fluence of 5x10~(15) ions/cm~2, a re-entrant metal-insulator type transition was observed. Furthermore a significant improvement in the low field MR was observed for fields less than 500mT. These results are interpreted in terms of subtitution of Cr ions onto Mn sites and the creation of a magnetically inhogeneous material and the influence of oxygen deficiency.
机译:用不同能量密度的200keV Cr离子注入超磁致电阻材料La_(0.7)Ca_(0.3)MnO_3的薄膜。为了确定注入的磁离子对磁阻(MR)的影响,在零磁场和高达8T的施加磁场中进行了电阻率测量。随着Cr能量密度的增加,电阻率增加,并且由于氧损失和缺陷的产生,金属-绝缘体转变(MI)温度被抑制到低于实验上可达到的温度范围。但是,对于最高通量为5x10〜(15)离子/ cm〜2,观察到了可重入的金属-绝缘体类型跃迁。此外,对于小于500mT的磁场,还可以观察到低磁场MR的显着改善。这些结果可以解释为Cr离子取代到Mn位上,磁非均质材料的产生以及氧缺乏的影响。

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