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GaN and related materials for high power application

机译:GaN和相关材料用于大功率应用

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Unique properties of GaN and related semiconductors make them superior for high-power applications. The maximum density of the two-dimensional electron gas at the GaN/AlGaN heterointerface or in GaN/AlGaN quantum well structures can reach 5x10~(13) cm~(-3), which is more than an order of magnitude highe than for traditional GaAs/AlGaAs heterostructures. The mobility-sheet carrier concentration product for these two dimensional systems might also exceed that for GaAs/AlGaAs heterostructures and can be further enhanced by doping the conducting channels and by using "piezoelectric" doping, which takes advantage of high piezoelectric constants of GaN and related materials. We estimate the current densities over 20 A/mm can be reached in GaN-based High Electron Mobility Transistors (HEMTs). These high current values can be combined with very high breakdown voltages in high-power HEMTs. These breakdown voltages are expected to rach several thousand volts. Recent Monte Carlo simulations point to strong ballistic and overshoot effects in GaN and related materials, which should be even more pronounced than in GaAs-based compounds but at much higher electric fields. This should allow us to achieve faster switching, minimizing the power dissipation during switching events. Self-heating, which is unavoidable in power devices, raises operating temperatures of power devices well above the ambient temperature. For GaN-based devices, the use of SiC substrates having high thermal conductivity is essential for ensuring an effective heat dissipation. SUch an approach combines the best features of both GaN and SiC technologies; and gaN/SiC-based semiconductors and heterostructures should find numerous applications in power electronices.
机译:GaN和相关半导体的独特性能使其在高功率应用中表现出色。 GaN / AlGaN异质界面或GaN / AlGaN量子阱结构中的二维电子气的最大密度可以达到5x10〜(13)cm〜(-3),比传统技术高出一个数量级。 GaAs / AlGaAs异质结构。这两个二维系统的迁移率表载流子浓度乘积也可能超过GaAs / AlGaAs异质结构,并且可以通过掺杂导电沟道和使用“压电”掺杂(利用GaN和相关材料的高压电常数的优势)来进一步提高。材料。我们估计,基于GaN的高电子迁移率晶体管(HEMT)可以达到20 A / mm以上的电流密度。这些高电流值可以与高功率HEMT中的很高击穿电压结合在一起。这些击穿电压有望达到数千伏。最近的蒙特卡洛模拟表明,GaN和相关材料具有强大的弹道效应和过冲效应,与基于GaAs的化合物相比,这种效应应该更明显,但电场要高得多。这应该使我们能够实现更快的切换,从而将切换事件期间的功耗降至最低。在功率设备中不可避免的自加热会导致功率设备的工作温度远高于环境温度。对于GaN基器件,使用具有高导热率的SiC衬底对于确保有效的散热是必不可少的。这种方法结合了GaN和SiC技术的最佳功能;以及基于gaN / SiC的半导体和异质结构将在电力电子中找到许多应用。

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