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ELECTROCRYSTALLIZATION OF METALS AND MODERN NANOTECHNOLOGY

机译:金属的电结晶与现代纳米技术

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摘要

Nanostructures on solid surfaces with a lateral width of less than 10 nm can only be directly produced, i. e. without lithographic intermediate steps, by local electrodeposition of metals on foreign substrates using in situ Scanning Probe Microscopy as an atomic tool combined with appropriate polarization techniques of both the substrate and the probe. At present, 0D metallic nanoclusters on foreign metals, graphite, superconducting films, and semiconductors have been formed. Investigations on the electrochemical formation of 1D and 2D nanostructures by local electrocrystallization processes are in progress. Nanostructures on semiconductors and foreign metals are of great importance for nanoelectronic and nanomagnetic devices, respectively. Quantum phenomena are expected to occur in small nanoelectric devices even at room temperature.
机译:固态表面上横向宽度小于10 nm的纳米结构只能直接生产,即。 e。无需光刻中间步骤,通过使用原位扫描探针显微镜作为原子工具结合外来基板上的金属局部电沉积,并结合适当的基板和探头极化技术,即可完成。目前,已经形成了异物,石墨,超导膜和半导体上的0D金属纳米簇。关于通过局部电结晶过程电化学形成一维和二维纳米结构的研究正在进行中。半导体和外来金属上的纳米结构分别对纳米电子和纳米磁性器件非常重要。即使在室温下,也有望在小型纳米电器件中发生量子现象。

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