首页> 外文会议>Symposium on Engineered Porosity for Microphotonics and Plasmonics; 20031202-20031204; Boston,MA; US >Anodization Time Dependent Photoluminescence Intensity of Porous Silicon
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Anodization Time Dependent Photoluminescence Intensity of Porous Silicon

机译:多孔硅的阳极氧化时间依赖性光致发光强度

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The photoluminescence (PL) intensity first increases with anodization time (t_a) and then decreases at very large t_a. The increase in PL intensity with t_a may be understood if the PL intensity is taken to be proportional to the effective volume of porous silicon (PS) layer under the probe laser beam. The effective volume of PS layer will be proportional to its thickness and reciprocal to the porosity. For a fixed anodization condition, the thickness and porosity both increase with t_a. The increase in thickness increases the effective PS volume, while the increase in porosity causes the effective volume to decrease. Therefore, the intensity variation is governed by these two parameters: thickness and porosity. The observed results suggest that the thickness dominates the PL intensity initially and then the porosity becomes more important for very long t_a. The PS layers prepared under ambient light illumination also exhibited the similar behaviour. The intensity variation with t_a was explained as the interplay of thickness and porosity variations with t_a.
机译:光致发光(PL)强度首先随着阳极氧化时间(t_a)的增加而增加,然后在非常大的t_a处减小。如果PL强度与探测激光束下方的多孔硅(PS)层的有效体积成比例,则可以理解PL强度随t_a的增加。 PS层的有效体积与它的厚度成正比,与孔隙率成反比。对于固定的阳极氧化条件,厚度和孔隙率均随t_a的增加而增加。厚度的增加会增加有效PS体积,而孔隙率的增加会导致有效体积减少。因此,强度变化受以下两个参数控制:厚度和孔隙率。观察到的结果表明,厚度最初在PL强度中占主导地位,然后孔隙率在很长的t_a内变得更为重要。在环境光照射下制备的PS层也表现出相似的行为。随t_a的强度变化被解释为厚度和孔隙率随t_a的相互作用。

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