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Time-resolved measurements of overlayer ordering in electrodeposition

机译:电沉积中涂层有序的时间分辨测量

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We report in situ time-resolved surface x-ray scattering measurements of the underpotential deposition of Cu_2+ on Pt(111) in the presence of Cl~- in HClO_4 solution. Cronoamperometric (current vs. time) measurements indicate that after a potential step, the electrode-position current decays to 1/e of its initial value in at most 0.12 seconds.In contrast, our simulataneous time-resolved surface x-ray scattering data reveal that the overlayer requires on the order of two seconds to develop long-range periodic order. These results demonstrate that the kinetics of surface ordering can be significantly different from the kinetics of charge-transfer and illustrate the power of time-resolved surface x-ray scattering for in situ studies of electrodeposition.
机译:我们报告原位时间分辨的表面x射线散射测量的在Cl〜-在HClO_4溶液中的Cu在Pt(111)上的Cu_2 +的欠电位沉积。电流法(电流与时间)的测量表明,在电位阶跃之后,电极位置电流最多在0.12秒内衰减到其初始值的1 / e。相反,我们同时分析的表面X射线散射数据显示覆盖层需要大约两秒钟的时间才能形成远程周期性的命令。这些结果表明,表面有序动力学可能与电荷转移动力学显着不同,并说明了电沉积原位研究中时间分辨表面X射线散射的能力。

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