首页> 外文会议>Symposium on Amorphous and Heterogeneous Silicon-Based Films―2002, Apr 2-5, 2002, San Francisco, California >Energetics of Interstitial Hydrogen and Hydrogen Diffusion in Realistic Models of a-Si:H
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Energetics of Interstitial Hydrogen and Hydrogen Diffusion in Realistic Models of a-Si:H

机译:a-Si:H现实模型中间隙氢和氢扩散的能量学

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摘要

In order to determine the mechanism or mechanisms of hydrogen transport in a-Si:H one must identify the reactions that bring deeply bonded H (on dangling bonds) to the transport band which is some form of interstitial hydrogen. Further, one must have reliable estimates of the energy difference between these deep states and transport states as well as the barrier energies among transport sites. In this paper we consider all of these ingredients in order to partially explain how hydrogen migrates in a-Si:H.
机译:为了确定氢在a-Si:H中的传输机理,必须确定将深键合的H(在悬空键上)带到以某种形式的间隙氢形式的传输带的反应。此外,必须对这些深度状态和传输状态之间的能量差以及传输地点之间的势垒能量具有可靠的估计。在本文中,我们考虑所有这些成分,以便部分解释氢如何在a-Si:H中迁移。

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