首页> 外文会议>Symposium on Advanced Optical Processing of Materials; 20030422-20030423; San Francisco,CA; US >Direct Photo-Imprinting in High Photosensitive Organically Modified Germanosilicate (ORMOGSIL) Glasses
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Direct Photo-Imprinting in High Photosensitive Organically Modified Germanosilicate (ORMOGSIL) Glasses

机译:在高感光度有机改性锗硅酸盐(ORMOGSIL)眼镜中直接进行光压印

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摘要

Direct photo-imprinting of both surface relief pattern and refractive index modulation upon the organically modified germanosilicate (ORMOGSIL) glass using its large volume change was performed by ultraviolet exposure. A large refractive index increase up to 10~(-2) is induced by ultraviolet-induced densification in the ORMOGSIL glasses. The photosensitivity in the ORMOGSIL glass was enhanced by introducing a photo-polymerizable methcrylate group in the glass structure. Also, a surface AFM scans and optical microscope images of unetched sample show that the volume compaction in the ultraviolet illuminated region is associated with periodic pattern inscription.
机译:通过紫外曝光,在有机改性的锗硅酸盐(ORMOGSIL)玻璃上进行了较大的体积变化,从而直接对表面浮雕图案和折射率调制进行了光压印。紫外线引起的ORMOGSIL玻璃中的致密化使折射率增加至10〜(-2)。通过在玻璃结构中引入可光聚合的甲基丙烯酸酯基团,可以提高ORMOGSIL玻璃的光敏性。同样,未蚀刻样品的表面AFM扫描和光学显微镜图像显示,紫外线照射区域中的体积压实与周期性图案刻印有关。

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