Molecular beam epitaxial growth of BSCCO and Bi-based oxides: self-limiting growth of the Bi element

摘要

Abstract: Self-limiting function of Bi element in connection with experimental results of sticking coefficients of constituent atoms of BSCCO is described. Molecular beam epitaxial growth of Bi$-2$/Sr$-2$/CuO$-x$/ (Bi2201) and Bi$-4$/Ti$-3$/O$-12$/ (BIT) is demonstrated using this function. A further advanced method and its growth results for Bi$-2$/Sr$-2$/CaCu$-2$/O$- x$/ (Bi2212) and Bi$-2$/Sr$-2$/Ca$-2$/Cu$-3$/O$-x$/ (Bi2223) growth are shown, where a chemical reaction between Bi2201 molecular layer and one or two monolayers of Ca and Cu deposited on Bi2201 is used. Estimation by means of X-ray diffraction, reflection high-energy electron diffraction, and atomic force microscopy shows excellent quality of the films obtained. Heteroepitaxial growth of BIT/Bi2201 using the self- limiting function of Bi is also done. !14