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Design and testing of polysilicon surface-micromachined piston micromirror arrays

机译:多晶硅表面微加工活塞微镜阵列的设计与测试

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Abstract: THis paper presents optical testing of polysilicon surface micromachined piston micromirror arrays. Similar piston micromirror arrays were fabricated using two different commercially available surface micromachining foundry processes: the DARPA supported multi-user MEMS processes (MUMPs), and Sandia Ultra-planar Multi-level MEMS Technology (SUMMiT). All test arrays employ square reflecting elements in an 8 $MUL 8 element 203 $mu@m square grid. Fabrication constraints limit the MUMPs designs to fill-factors of less than 80 percent. The chemical mechanical polishing planarization step integral to the SUMMiT process allows an as-drawn fill-factor of 95 percent to be easily achieved. MUMPs designs employ both the standard gold metallization and maskless sputtered chromium/gold post-process metallization, while post process metallization is the only option for the SUMMiT design. Testing of the micromirror arrays focuses on microscope interferometer characterization of mirror topography, and measurement of the far field diffraction pattern for each. The measured results show that control of the individual micromirror element surface topography is more important for imaging applications than maximizing the as-drawn fill-factor. !10
机译:摘要:本文介绍了多晶硅表面微加工活塞微镜阵列的光学测试。类似的活塞微镜阵列是使用两种不同的市售表面微加工铸造工艺制造的:DARPA支持的多用户MEMS工艺(MUMP)和Sandia超平面多层MEMS技术(SUMMiT)。所有测试阵列均在8×MUL 8元素203×mu @ m方格中使用方形反射元素。制造限制将MUMP设计限制为小于80%的填充因子。 SUMMiT工艺必不可少的化学机械抛光平坦化步骤可轻松实现95%的绘制填充率。 MUMPs设计同时使用标准的金金属化和无掩模溅射铬/金后处理金属化,而后处理金属化是SUMMiT设计的唯一选择。对微镜阵列的测试着重于显微镜干涉仪对镜面形貌的表征,以及每种镜面的远场衍射图样的测量。测量结果表明,对单个微镜元件表面形貌的控制对于成像应用比最大化所绘制的填充因子更为重要。 !10

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