Photocatalytic Decomposition of Organic Matter on Titanium Dioxide Film prepared by PECVD

摘要

This work presents a comparison study of photochemical activity of titanium dioxide deposited by three different methods: by low pressure plasma enhanced chemical vapor deposition (PECVD): capacitive radio frequency (RF) discharge, by atmospheric pressure PECVD barrier torch plasma jet and by low pressure physical vapor deposition (PVD) hollow cathode plasma jet sputtering system. Vapors of titanium (IV) isopropoxide Ti[OCH(CH_3)_2]_4 were used as growth precursors for titanium dioxide films depositon by the both PECVD methods, whereas titanium hollow cathode nozzle was reactively sputtered in the PVD method. Titanium dioxide films were studied by X-ray diffraction (XRD) for crystalline phase analysis and furthermore by measurement of thickness and deposition rate. All the systems produce film with anatase structure. The photochemical activity was tested on decomposition of the Acid orange (AO7). The films also manifest strong microbiological activity, which is demonstrated on inactivation of bacteria.