首页> 外文会议>Sixth International Symposium on Diamond Materials, 6th, Oct 17-22, 1999, Honolulu, Hawaii >THE INCORPORATION OF Pt AND Pt/Ru PARTICLES IN BORON-DOPED DIAMOND THIN-FILMS: APPLICATIONS IN ELECTROCATALYSIS
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THE INCORPORATION OF Pt AND Pt/Ru PARTICLES IN BORON-DOPED DIAMOND THIN-FILMS: APPLICATIONS IN ELECTROCATALYSIS

机译:掺硼金刚石薄膜中Pt和Pt / Ru颗粒的掺入:在电解中的应用

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Polycrystalline, boron-doped diamond thin films were co-deposited with Pt particles on either conducting Si (100) or Pt substrates. These dimensionally stable and corrosion-resistant diamond thin-films consist of well-faceted microcrystallites with dispersed Pt particles incorporated into the surface. The metal particles are anchored into the diamond surface and range from 10 to 500 nm in diameter. The active Pt metal loading was in the range of 200 to 400 ng/cm~2 (diamond electrode geometric area); however, the real catalyst loading was estimated to be near 0.1 mg/cm~2. Importantly, the Pt particles at the surface were in electronic communication with the current collecting Si or Pt substrate through the boron-doped diamond matrix, and they were electroactive for the UPD of hydrogen and the oxidation of methanol. The dispersed Pt particles are extremely stable as no loss in the activity was observed after 1000 potential cycles between the oxygen and hydrogen evolution regimes in 0.1 M HClO_4. The films were fully characterized by scanning electron microscopy, energy dispersive x-ray analysis, atomic force microscopy, auger electron spectroscopy, Raman spectroscopy, powder x-ray diffraction, secondary ion mass spectrometry and cyclic voltammetry.
机译:将多晶掺硼金刚石薄膜与Pt颗粒共沉积在导电的Si(100)或Pt衬底上。这些尺寸稳定且耐腐蚀的金刚石薄膜由切面细小的微晶组成,这些微晶中掺有分散的Pt颗粒。金属颗粒锚固在金刚石表面中,直径范围为10至500 nm。 Pt的活性金属负载在200至400 ng / cm〜2(金刚石电极几何面积)的范围内。然而,实际催化剂负载量估计接近0.1mg / cm 2。重要的是,表面上的Pt颗粒通过掺硼金刚石基质与集电Si或Pt衬底电子连通,并且它们对氢的UPD和甲醇的氧化具有电活性。分散的Pt颗粒非常稳定,因为在0.1 M HClO_4中的氧气和氢气放出方案之间进行了1000个潜在循环后,未观察到活性损失。通过扫描电子显微镜,能量色散X射线分析,原子力显微镜,俄歇电子能谱,拉曼光谱,粉末X射线衍射,二次离子质谱和循环伏安法对薄膜进行了全面表征。

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