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Er- and Nd-implanted MOS light emitting devices and their use for integrated photonic applications

机译:注入Er和Nd的MOS发光器件及其在集成光子应用中的用途

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In the past, the suitability of Er for Si-based light emission was already investigated in detail. However, much less attention has been paid to Nd with its main electroluminescence (EL) line around 900 nm. In this study we compare the electrical and EL p
机译:过去,已经详细研究了Er对基于Si的发光的适用性。但是,由于Nd的主要电致发光(EL)线约为900 nm,因此对Nd的关注较少。在这项研究中,我们比较了电气和EL p

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