FABRICATION OF CoNiP DOT ARRAYS FOR PATTERNED MAGNETIC RECORDING MEDIA WITH ELECTROLESS DEPOSITION PROCESS

摘要

Magnetic dot arrays were fabricated onto n-type Si substrate with patterned SiO2 resist by electroless deposition process. Electroless CoNiP bath producing the magnetic rnin film with perpendicular magnetic anisotropy was applied for the fabrication of the dot arrays. The fabrication of the CoNiP dot arrays with 200-270 nm diameter was achieved with sufficient selectivity only by immersing the pre-treated substrate into the bath, verifying the validity of the electroless deposition process. Moreover, the deposited magnetic dots possessed clear magnetization state in single state with no distribution at dc-remanent state, while reversed domains were observed if the CoNiP was formed as continuous film, suggesting that the shape anisotropy in the perpendicular direction of the dot arrays with high aspect ratio enhanced the formation of the single domain state.