首页> 外文会议>Recent Developments in Advanced Materials and Processes; Materials Science Forum; vol.518 >Electrochemical Behaviour of a Composite Rh/TiO_2 Layer Formed Potentiodynamically on Titanium Surface
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Electrochemical Behaviour of a Composite Rh/TiO_2 Layer Formed Potentiodynamically on Titanium Surface

机译:钛表面电位动力学形成的复合Rh / TiO_2层的电化学行为

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Potentiodynamic polarization of a mechanically polished titanium electrode in a diluted solution of Rhodium(III) chloride in 0.1 M perchloric acid was performed, resulting in simultaneous formation of both Rh and TiO_2 films. The morphology of obtained Rh/TiO_2 composite film followed the morphology of titanium support, as evidenced by SEM technique. This composite surface was examined by cyclic voltammetry in both acidic and alkaline solutions, in the potential region of both hydrogen and oxygen underpotential deposition. The charge related to hydrogen underpotential deposition corresponded to a surface roughness of 43. As a consequence of high surface roughness, the diffusion current of oxygen reduction in an oxygen saturated 0.1 M NaOH solution, measured by voltammetry on rotating disc electrode, was found to be comparable to the current of hydrogen underpotential deposition.
机译:机械抛光的钛电极在氯化铑(III)在0.1 M高氯酸中的稀释溶液中进行了电位动力学极化,导致同时形成Rh和TiO_2膜。 SEM观察到,所得的Rh / TiO_2复合膜的形貌与钛载体的形貌一致。通过循环伏安法,在酸性和碱性溶液中,在氢和氧的电势不足区域,对复合材料表面进行了检查。与氢欠电位沉积有关的电荷对应于43的表面粗糙度。由于高的表面粗糙度,发现在旋转圆盘电极上通过伏安法测得的氧饱和0.1 M NaOH溶液中氧还原的扩散电流为可与氢不足位沉积的电流相媲美。

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