Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai, India;
Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai, India;
Department of Electronics and Communication, S. V. National Institute of Technology, Surat,India;
Ion Accelerator Development Division, Bhabha Atomic Research Centre, Mumbai, India;
Ion Accelerator Development Division, Bhabha Atomic Research Centre, Mumbai, India;
Ion Accelerator Development Division, Bhabha Atomic Research Centre, Mumbai, India;
Department of Electrical Engineering, Indian Institute of Technology Bombay, Mumbai, India;
MBE; InAs/GaAs QDs; Photoluminescence; Photolithography; Dark Current; Activation energy; 3-D confinement; InAlGaAs;
机译:生长后退火对四元In_(0.21)Al_(0.21)Ga_(0.58)的35层In_(0.50)Ga_(0.50)As / GaAs量子点红外光电探测器的材料和器件特性的影响的详细研究封顶
机译:具有四元In_(0.21)Al_(0.21)Ga_(0.58)As封盖的高性能长波(〜10.2μm)InGaAs / GaAs量子点红外光电探测器
机译:具有Al_(0.9)Ga_(0.2)As_(0.1)Sb_(0.9)势垒层的中红外InAs_(0.79)Sb_(0.21)基nBn光电探测器,以及与InAs_(0.87)Sb_(0.13)引脚二极管的比较使用界面失配阵列在GaAs上生长
机译:低能量H〜离子注入对季合金电气和材料特性的影响(IN_(0.21)AL_(0.21)GA_(0.58)AS)升压INAS / GAAS N-I-N Qdips
机译:点缺陷对低能离子注入中电子性能的影响。
机译:离子能量,离子通量和蚀刻温度对GaAs的电气和材料质量的影响,通过电子回旋源蚀刻
机译:极低表面能(<11 dyn cm-1)用于膜分离的异相高分子材料:综合聚合物化学/工程方法和反吹对新型纳滤膜污垢修复性能的影响