Tessellated probe as an aid to process development

摘要

Abstract: The tessellated probe is a large area single-sided array of electrostatic probe elements arranged to simulate a wafer of 200 mm diameter during processing within a plasma system. Various modes of operation are available including the standard negative DC bias for ion saturation measurements. Total ion flux and spatial distribution can be measured, giving two very useful parameters for process development. Measurements can also be made in the presence of simultaneously applied RF bias.!5