首页> 外文会议>Proceedings of the 10th symposium on accelerator science and technology >Study of ECRIS for highly charged ion production: HiECR MK3
【24h】

Study of ECRIS for highly charged ion production: HiECR MK3

机译:用于高电荷离子生产的ECRIS研究:HiECR MK3

获取原文
获取原文并翻译 | 示例

摘要

The former HiECR had good performances in 6 and 10 [GHz] operations, while in the case of 14 [GHz] operation, the intensity of highly-charged heavy ions was very low [1,2,3]. It seemed that the result was due to the narrow gap(3[mm] or less) between the surface of ECR zone and that of the chamber wall.rnHiECR MK3 has been designed to produce strong axial mirror field and radial hexapolar field enough to 14 [GHz] operation.rnThe HiECR MK3 was constructed and operated for the first time.
机译:以前的HiECR在6和10 [GHz]操作下具有良好的性能,而在14 [GHz]操作的情况下,高电荷重离子的强度非常低[1,2,3]。似乎是由于ECR区域的表面与腔室壁的表面之间的间隙很小(3 [mm]或更小)所致。rnHiECR MK3被设计为产生足够强的轴向镜像场和径向六极场,可达到14 HiECR MK3首次构建并运行。

著录项

  • 来源
  • 会议地点 Hitachinaka(JP)
  • 作者单位

    Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology Meguro-ku, Tokyo, Japan;

    Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology Meguro-ku, Tokyo, Japan;

    Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology Meguro-ku, Tokyo, Japan;

    Research Laboratory for Nuclear Reactors, Tokyo Institute of Technology Meguro-ku, Tokyo, Japan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 加速器;
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号