A NOVEL TECHNIQUE FOR CONSTRUCTING A PLASMA MICRO-UNDULATOR AND A COMPACT SOFT X-RAY SOURCE

摘要

The plasma micro-undulator is a compact light source in which a relativistic electron beam radiates in an oscillating electric field of the rippled ion-space-charge instead of an oscillating magnetic field of conventional undulators. In the present paper, we propose a new method of creating the plasma micro-undulator: a combined technique of laser interference and resonant photoionization, where the pitch and density of plasma ripples have been controlled separately by a laser alone. A preliminary design of the undulator with the pitch of 10-100 μm, the number of ripples of 100-1000 and the undulator constant of 0.1-1.0 has been discussed.