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Dark Current and DQE Improvements of Mercuric Iodide Medical Imagers

机译:碘化汞医学成像仪的暗电流和DQE改进

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摘要

A new TFT array has been developed specifically for mercuric iodide (HgI_2) deposition. This new TFT array combined with a modified HgI_2 Physical Vapor Deposition (PVD) process provides less than 10 Pa/mm~2 dark current at room temperature (22℃) measured at 1 V/μm electrical field. This photoconductor (direct) imager was run at 10 fr/s framerate and gave a measured sensitivity of 19 μC/(R~*cm~2) using a RQA5 radiation quality x-ray beam (70kVp x-ray with 21 mm Al filtering). This sensitivity value is higher than the sensitivity reported by our group for any previous HgI_2 imagers. MTF, NPS and DQE values were also evaluated on this 13 cm × 13 cm size imager with 127 μm pixel pitch. The MTF value is higher than 40% at the Nyquist frequency (3.9 lp/mm). This is much better than the MTF of a 600 urn CsI scintillator/photodiode (indirect) imager, which is only 16% (Varian internal data) and it is similar to the MTF value of the a-Se (another photoconductor) imagers. The first frame image lag is less than 8% when the imager was run at a 10 fr/s framerate. The low dark current and some noise reduction in the detector electronics, made it possible for the DQE to be measured down to low fluoroscopic dose levels ( < 4 μR/fr). The DQE(0) value is over 50% at a dose of 35 μR/fr and still about 40% at 3.76 μR/fr. The 270 μm thick PVD HgI_2 layer only absorbs less than 75% of the ~51 keV mean energy X-ray photons (70 kVp RQA5 filtered beam). This means that if the thickness of the HgI_2 layer is increased to 500 μm (increasing the absorption up to over 90%) the DQE(0) should then increase to about 60- 65% (assuming everything else remains unchanged). This value is close to the 65 - 70 % DQE(0), measured for the indirect (CsI) imagers at higher doses. Such a high DQE value makes this material competitive both for fluoroscopic and for radiographic applications.
机译:已经开发了一种新的TFT阵列,专门用于碘化汞(HgI_2)沉积。这种新的TFT阵列结合改进的HgI_2物理气相沉积(PVD)工艺,在1 V /μm电场下在室温(22℃)下可提供小于10 Pa / mm〜2的暗电流。该光电导体(直接)成像仪以10 fr / s帧频运行,并使用RQA5辐射质量x射线束(70kVp x射线和21毫米Al滤光片)测得的灵敏度为19μC/(R〜* cm〜2) )。该灵敏度值高于我们小组报告的任何以前的HgI_2成像仪的灵敏度。在此13 cm x 13 cm尺寸的成像仪上,以127μm像素间距评估了MTF,NPS和DQE值。在奈奎斯特频率(3.9 lp / mm)下,MTF值高于40%。这比600微米CsI闪烁体/光电二极管(间接)成像仪的MTF好得多,后者仅为16%(瓦里内部数据),并且与a-Se(另一种光电导体)成像仪的MTF值相似。当成像仪以10 fr / s帧速运行时,第一帧图像滞后小于8%。检测器电子器件中的低暗电流和某些降噪功能使DQE可以低至低荧光剂量水平(<4μR/ fr)进行测量。在35μR/ fr的剂量下,DQE(0)值超过50%,而在3.76μR/ fr的情况下仍约为40%。厚度为270μm的PVD HgI_2层仅吸收不到〜51 keV平均能量X射线光子(70 kVp RQA5过滤光束)的75%。这意味着,如果HgI_2层的厚度增加到500μm(将吸收增加到90%以上),则DQE(0)应该增加到大约60-65%(假设其他所有条件都保持不变)。该值接近于较高剂量下的间接(CsI)成像仪测得的65%-70%DQE(0)。如此高的DQE值使该材料在荧光检查和X射线照相应用中均具有竞争力。

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