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Tribological and Micro-Optical Characteristics of a Minute Aperture Mounted Miniaturized Optical Head Slider

机译:微小孔径安装的微型光学头滑块的摩擦学和微光学特性

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Recent rapid progress in a digital network society necessitates storage devices with higher-density and faster transfer rates. In optical storage, a novel recording principle is eagerly awaited that will drastically improve recording density without being restricted by a wavelength shortening limit or a numerical aperture (N.A.) limit of the optics utilized. Storage based on the "near-field" principle is thought to be one of the most promising breakthroughs for overcoming various tough limitations governing traditional optical recording. From this perspective, we have already proposed an integrated optical head slider assembly that relies on the novel near-field principle for its operation; it is mounted on a minute tapered aperture and has a planar focusing lens and a micro silicon mirror. Readout signals corresponding to a 200-nm-long bit have demonstrated a frequency band up to approximately 10 MHz, using a chromium patterned medium. In this study, we have investigated a tribological (glide height) property and flying stability of a miniaturized 1.5-mm-long optical head slider by using acoustic emission sensor signal and readout signal from the medium. We have also evaluated detecting performance separately using traditional 3.2-mm-long slider and a chromium patterned medium whose bit patterns are accurately scored with bit lengths less than 100 nm using electron beam lithography including reactive ion etching. We have confirmed stable flying performance of 1.5-mm-long slider assembly and furthermore, ability of detecting sub-100-nm long bit patterns.
机译:在数字网络社会中,近来的快速发展要求存储设备具有更高的密度和更快的传输速率。在光学存储中,迫切需要一种新颖的记录原理,它将大大提高记录密度,而不受所用光学器件的波长缩短极限或数值孔径(N.A.)极限的限制。基于“近场”原理的存储被认为是克服控制传统光学记录的各种严格限制的最有希望的突破之一。从这个角度出发,我们已经提出了一种集成的光学头滑块组件,该组件依靠新颖的近场原理进行操作。它安装在微小的锥形孔上,并具有一个平面聚焦透镜和一个微型硅镜。使用铬制图案的介质,对应于200 nm长的位的读出信号显示出高达10 MHz的频带。在这项研究中,我们通过使用声发射传感器信号和从介质中读出的信号,研究了1.5毫米长的小型光学头滑块的摩擦学性能(滑行高度)和飞行稳定性。我们还分别使用传统的3.2毫米长的滑块和铬制图案的介质分别评估了检测性能,该介质使用电子束光刻技术(包括反应性离子刻蚀)可以精确刻划位长小于100 nm的位图。我们已经确认了1.5毫米长的滑块组件的稳定飞行性能,此外,它还能够检测100纳米以下的长位图案。

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