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Microscope for measurement of discontinuous deep microstructure topography

机译:用于测量不连续深部微观结构形貌的显微镜

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Abstract: The paper describes the new microscope for accurately measuring the three-dimensional surface topography of deep and discontinuous microstructures, which is based on two- wavelength phase-shifting interferometry (PSI) and data analysis. The microscope mainly consists of dual-path interference microscopic optical system, CCD image sampling system, control system and data analysis/processing. The related techniques include five-step PSI technique, the generalized two-wavelength interferometry (TWI) and a new data analysis/processing technique. The depth resolution of the microscope is 0.5 nm, the depth measuring accuracy is better than 1.3 nm. When the 20X microscope objective (NA equals 0.4) is used, the spatial resolution of the microscope is about 0.5 micrometer, the field is about $phi 1.325 mm. !6
机译:摘要:本文介绍了一种新型的显微镜,该显微镜基于两波长相移干涉术(PSI)和数据分析,可以精确地测量深层和不连续微观结构的三维表面形貌。显微镜主要由双径干涉显微镜光学系统,CCD图像采样系统,控制系统和数据分析/处理系统组成。相关技术包括五步PSI技术,广义两波长干涉仪(TWI)和新的数据分析/处理技术。显微镜的深度分辨率为0.5 nm,深度测量精度优于1.3 nm。当使用20X显微镜物镜(NA等于0.4)时,显微镜的空间分辨率约为0.5微米,视野约为φ1.325毫米。 !6

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