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Luminescence of (Mg,Zn)Al_2O_4:Tb mixed spinel thin films prepared by spin-coating

机译:旋涂法制备(Mg,Zn)Al​​_2O_4:Tb混合尖晶石薄膜的发光

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MgAl_2O_4 and ZnAl_2O_4 both have the spinel structure and similar lattice constants, but the bandgap of MgAl_2O_4 is about double that of ZnAl_2O_4, making it interesting to consider the mixed spinel (Mg_xZn_(1-x))Al_2O_4 as a possible host for luminescent ions. Prior to preparing thin films, the Mg:Zn ratio and Tb concentration were optimized for green luminescence from the ~5D_4 - ~7F_5 transition of Tb~(3+) ions using nanocrystalline samples prepared by combustion synthesis. Thin films with x = 0.75 and 0.5 mol% Tb were spin-coated on Si(100) substrates using a solution of the nitrates of Mg, Zn, Al and Tb in ethanol, with ethylene glycol as complexing agent. Samples about 200 nm thick were obtained by sequentially depositing 10 layers at 3000 rpm for 30 s. Samples were annealed for 1 h in air before measuring their luminescence properties. For the sample annealed at 600 ℃, x-ray diffraction showed the thin film had a strong (111) preferential orientation. Atomic force microscopy revealed a root means square roughness of 1 nm and Auger electron spectroscopy depth profiles showed a uniform layer with a sharp interface at the Si substrate. With an increase in annealing temperature up to 1000 ℃, the luminescence increased while the surface became slightly rougher and the layer-substrate interface more interdiffused. Annealing the samples at 1200 ℃ resulted in diffusion of Si through the layer and the formation of an additional phase. While the green Tb emission was slightly reduced, blue emission from the ~5D_3 level of Tb~(3+) was greatly enhanced in these samples.
机译:MgAl_2O_4和ZnAl_2O_4都具有尖晶石结构和相似的晶格常数,但是MgAl_2O_4的带隙大约是ZnAl_2O_4的带隙,这使得将混合尖晶石(Mg_xZn_(1-x))Al_2O_4视为发光离子的宿主很有趣。在制备薄膜之前,使用燃烧合成制备的纳米晶体样品,通过从Tb〜(3+)离子的〜5D_4〜〜7F_5跃迁对Mg:Zn比和Tb浓度进行优化以实现绿色发光。使用Mg,Zn,Al和Tb的硝酸盐在乙醇中的溶液,以乙二醇作为络合剂,将x = 0.75和Tb摩尔百分比为0.5的薄膜旋涂在Si(100)衬底上。通过以3000 rpm的速度连续沉积10层30 s,获得约200 nm厚的样品。在测量样品的发光特性之前,将样品在空气中退火1小时。对于在600℃退火的样品,X射线衍射显示薄膜具有很强的(111)优先取向。原子力显微镜显示的均方根粗糙度为1 nm,俄歇电子能谱深度分布显示在Si基板上形成均匀且具有清晰界面的层。随着退火温度的升高(最高至1000℃),发光强度增加,而表面变得略微粗糙,并且层与基材之间的界面相互扩散。样品在1200℃退火导致Si扩散穿过该层并形成附加相。在这些样品中,虽然绿色的Tb排放量略有减少,但从〜5D_3的Tb〜(3+)水平发射的蓝色却大大增加了。

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