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Thin films for neutron optics

机译:中子光学薄膜

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Abstract: Thin film multilayers play a crucial role in the efficient transport of neutrons from the source to the experiments at the Swiss Neutron Spallation source SINQ. In order to develop and optimize the neutron optical components, a magnetron sputtering facility has been installed at PSI aimed at the deposition of thin films covering large substrate area. Initial uniformity tests are very encouraging showing thickness variation of only 1% for 5 nm layers over an area of 500 $MUL 400 mm$+2$/. A detailed study of the structure and stability of Ni/Ti multilayers in relation to the deposition conditions is underway and results from analysis using TEM, neutron and x-ray diffraction and reflection are presented. The results point toward the use of alloyed materials and reactive sputtering to sharpen and stabilize the interface between Ni and Ti.!8
机译:摘要:薄膜多层膜在中子从源头到瑞士中子散裂源SINQ的实验的有效传输中起着至关重要的作用。为了开发和优化中子光学组件,已在PSI安装了磁控溅射设备,旨在沉积覆盖较大基板面积的薄膜。最初的均匀性测试非常令人鼓舞,显示在500 $ MUL 400 mm $ + 2 $ /的面积上5 nm层的厚度变化仅为1%。 Ni / Ti多层膜的结构和稳定性与沉积条件有关的详细研究正在进行中,并给出了使用TEM,中子和X射线衍射和反射进行分析的结果。结果表明,使用合金材料和反应性溅射可锐化和稳定Ni和Ti之间的界面!8

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