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Nb~+ Polaron and Ti~3+ Shallow Donor Jahn-Teler Centers in LiNbO_3 Systems

机译:LiNbO_3系统中的Nb〜+极化子和Ti〜3 +浅供体Jahn-Teler中心

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The position of the conduction band edge in LiNbO_3 strongly depends on the presence of antisite niobiums (Nb on Li site) lowering the cutoff energy. This property can also be used for hgih precision routine contorl of the L/Nb ratio. The Nb 4d orbitals can form Nb~5+/4+ donor levels at these antisites, but this is possible at regular niobium sites as well due to nearby impurities and/or the polaron effect at low temperatures. Such shallow electron traps at niobium sites become important in heavily Mg-doped or stoichiometric crystals where no antisite niobiums are present. Trapping processes have recently been observed also on the nanometer timescale. The incorporation of the Ti dopant, used in particular for wave-guiding applications, has been shown to change upon Mg co-doping from Li to Nb substitution. Ti introduces in both cases shallow trapping levels in the gap. The properties of these traps, together with charge transfer processes between Nb~5+/4+ polaron ant Ti~4+/3+ shallow donor levels are discussed, and the Jahn-Teller effects of the involved d~1 paramagnetic states observed by EPR in reduced LiNbO_3:Ti and LiNbO_3:Mg:Ti are compared.
机译:LiNbO_3中导带边缘的位置强烈取决于降低截止能量的反位铌(Li位上的Nb)的存在。此属性还可用于L / Nb比的高精度常规控制。 Nb 4d轨道可在这些反位点形成Nb〜5 + / 4 +供体能级,但是由于附近的杂质和/或低温下的极化子效应,在规则的铌位点也可能这样做。在不存在反位铌的重度Mg掺杂或化学计量晶体中,铌位置处的此类浅电子陷阱变得很重要。近来也已经在纳米时间尺度上观察到诱捕过程。已显示,特别是用于波导应用的Ti掺杂剂的掺入会在Mg共掺杂时从Li替代Nb发生变化。在两种情况下,Ti都会在间隙中引入浅的陷阱能级。讨论了这些陷阱的性质以及Nb〜5 + / 4 +极化子Ti〜4 + / 3 +浅施主能级之间的电荷转移过程,并观察了所涉及的d〜1顺磁态的Jahn-Teller效应。比较还原的LiNbO_3:Ti和LiNbO_3:Mg:Ti中的EPR。

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